摘要
根据多晶硅PECVD的制程原理,分别验证温度、流量、功率等工艺参数对镀膜质量的影响,寻求最佳参数,从而达到优化工艺,改善镀膜颜色质量,保证颜色均匀性的目的。
According to principle of multi-crystalline silicon PECVD process,impacts of temperature,flow,power and other process parameters on coating quality are verified respectively.And optimized parameters are figured out to optimize process,improve color quality of coatings and ensure color uniformity.
出处
《通信电源技术》
2015年第3期60-61,共2页
Telecom Power Technology
关键词
氮化硅减反射膜
工艺参数
均匀性
silicon nitride antireflection film
process parameters
uniformity
