摘要
本文介绍了基于直线电机、洛仑兹平面电机的 0 1μm光刻机 6坐标高速超精工件台的结构设计 ,其在 30 0mm运动范围内 ,系统的定位精度和运动精度都达到纳米级 ,且具有优良的速度、加速度、变加速度等动态性能。
At present, the line-space of super large scale integrated circuit (SLSI) has been less than about 0.1μm. Manufacturing the SLSI, to expose 300mm silicon wafer, a step-and-scan photolithography has to have a long stroke within 400mm,and the system precision of localization and movement is required from several nm to dozens of nm, furthermore, it must have good dynamic answer performance of velocity, acceleration and the variety of acceleration. The existing multi-coordinate motion system, with ordinary transmission parts, is hardly to meet the requirements. So, a multi-coordinate motion system with high performance, high speed and super precision is becoming the throat (key technology) of SLSI manufacture. A structure design of 6-coordinate system exposure chuck has been introduced in detail in this paper. The exposure chuck system is the key sub-system of 0.1μm lithography. LinerMotor, voice coil motor and lorenz plane motor are adopted to constitute multilevel execution parts to ensure the realization of high performance, high speed and super precision.
出处
《微电子技术》
2003年第4期1-5,13,共6页
Microelectronic Technology
基金
国家 8 6 3计划<高速高精运动控制器技术研究>(编号 :2 0 0 1AA4 2 3170 )资助
关键词
光刻机
步进扫描
高速高精
Photolithography
Stage
high speed and super precision
