摘要
提出一种利用电化学沉积法制备Cr纳米离散晶核实现超薄铜箔剥离的策略。结果表明,该方法可以制备厚度约为1.34μm的铜箔。Cr纳米离散晶核密度直接影响铜箔的剥脱性能、表面粗糙度和电阻率。当Cr纳米离散晶核密度为15.7×10^(9)cm^(−2)时,铜箔的剥离性能最好,电阻率为4.95×10^(−7)Ω·m,比常规厚度为0.67μm Cr涂层的电阻率低9.2%,比重铬酸钾涂层的电阻率低15.8%,抗拉强度超过248.80 MPa。
An electrochemical deposition strategy for discrete Cr nano-nuclei to achieve ultrathin Cu foil stripping was proposed.The results indicated that this method could be utilized to prepare Cu foils with a thickness of about 1.34μm.The Cr discrete nucleus density directly affects the stripping performance,surface roughness,and resistivity of Cu foils.Under our experimental conditions,the stripping performance of Cu foil was the best at a Cr discrete nucleus density of 15.7×10^(9)cm^(−2)and resistivity of 4.95×10^(−7)Ω·m,9.2%lower than that of conventional Cr coating of 0.67μm in thickness and 15.8%lower than that of the coating with potassium dichromate,and the tensile strength exceeds 248.80 MPa.
作者
杨光
惠越
陈菊
李波
陈建华
刘铠
梁桂德
邓丁榕
Guang YANG;Yue HUI;Ju CHEN;Bo LI;Jian-hua CHEN;Kai LIU;Gui-de LIANG;Ding-rong DENG(College of Marine Equipment and Mechanical Engineering,Jimei University,Xiamen 361021,China;Fujian Yegood Technology Co.,Ltd.,Jinjiang 362241,China)
基金
The authors are grateful for the financial support from the National Natural Science Foundation of China(No.52175407).
关键词
电沉积
铜箔
离散纳米核
剥离
电阻率
electrodeposition
Cu foils
discrete nano-nuclei
stripping
resistivity
