摘要
吸附溶出伏安法是近年发展起来的一种新的电分析方法。Kalvoda[1.2]等对其机理及应用作了报导,孙长林等研究了铜(Ⅱ)存在下痕量半胱氨酸(RSH)的阴极溶出行为,认为所得溶出峰为吸附溶出峰。本文对其机理作了进一步探讨,证实了其电积过程为吸附过程。并用拟定的方法,无需前处理,测定了人血清中ppm级的RSH,结果满意。
In this work,the adsorptive stripping behaviour of trace cysteine on mercury-film electrode in the presence of copper(Ⅰ)have been studied and the mechanism is discussed.The process of electric accumulation is considered that chemical reaction is previour to the adsorption.With Britton-Robinson solution(pH3.0)as medium,a sharp sensitive peak has been observed,and the cysteine concentration over the range of 1.0×10^(-10)-9.0×10^(-10)Mis in good linear relationship with the stripping peak current values.The detection limit is as low as 5.0×10^(-11)M.
作者
孙长林
胡伟
邵君波
朱亚尔
Sun Changlin;Hu Wei;Shao Junbo;Zhu Yaer(Department of Chemical Engineering,Zhejiang Institute of Technology,Hangzhou)
出处
《高等学校化学学报》
SCIE
EI
CAS
1986年第9期786-788,共3页
Chemical Journal of Chinese Universities
