摘要
研究了1.1 m大口径镀膜机热蒸发制备金属铝膜的膜厚均匀性问题,针对旋转平面夹具分析了夹具高度H以及蒸发源与真空室中心轴距离L对铝膜膜厚均匀性的影响。当L=400 mm,H/L=1.10时,膜厚均匀性最好,不均匀性为9.614%,不均匀性随H/L的值增大而增大。当H=500 mm,H/L=1.47时,膜厚均匀性最好,不均匀性为4.487%,不均匀性随H/L的值减小而增大。进而引进了一个修正挡板函数,提出并设计了合适的修正挡板,膜厚均匀性由不加修正挡板时的17.8%改善到3.9%,从而解决铝薄膜厚度均匀性问题。
The uniformity of the film thickness of the aluminum film deposited by the thermal evaporation of the 1.1 m large-diameter coating machine is studied. For the rotating plane fixture,the influence of the fixture height H and the distance L between the evaporation source and the central axis of the vacuum chamber on the uniformity of the aluminum film thickness is analyzed. When L=400 mm and H/L=1.10,the film thickness uniformity is the best,the unevenness is 9.614%,and the unevenness increases as the value of H/L increases. When H=500 mm and H/L=1.47,the film thickness uniformity is the best,the unevenness is 4.487%,and the unevenness increases as the value of H/L decreases. Furthermore,a modified baffle function is introduced,and a suitable correction mask is proposed and designed. The film thickness uniformity is improved from 17.8% without the correction mask to 3.9%,thereby solving the problem of aluminum film thickness uniformity.
作者
樊彦峥
潘永强
刘金泽
张达
FAN Yan-zheng;PAN Yong-qiang;LIU Jin-ze;ZHANG Da(School of Photoelectric Engineering,Xi’an Technological University,Xi’an 710021,China)
出处
《光学与光电技术》
2021年第2期108-114,共7页
Optics & Optoelectronic Technology
基金
陕西省自然科学基础研究计划(2018JM6031)
陕西省教育厅重点实验室科研计划(18JS054)资助项目。
关键词
光学薄膜
铝膜
旋转平面夹具
膜厚均匀性
修正挡板
optical thin film
aluminum film
rotating plane fixture
film thickness uniformity
correction mask
