摘要
采用磁控溅射法在Pt/Ti/SiO2/Si衬底上制备了(Ba,Sr)TiO3薄膜。基于薄膜的形核理论,研究了溅射气压、靶基距、衬底温度和溅射功率等溅射参数对(Ba,Sr)TiO3薄膜择优取向生长的影响。实验结果表明:磁控溅射中,较高衬底温度(600℃)有助于钙钛矿成相;通过改变磁控溅射参数,能得到(111)、(001)、(110)择优取向的薄膜。
（Ba, Sr）TiO3 films were fabricated on Pt/Ti/SiO3/Si substrate by RF-magnetron sputtering. Based on the theory of film nucleation, the influences of RF sputtering parameters, such as sputtering pressure, substrate-target distance, substrate temperature, sputtering power etc. , on microstructure and preferred orientation of film were investigated. The experimental results indicate that higher substrate temperature favors the formation of the perovskite phase of the film. The （ 111 ）, （ 001 ）, （ 110 ）- preferred orientation can be obtained by changing the sputtering parameters.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2013年第1期52-57,共6页
Journal of Synthetic Crystals
基金
国家自然科学基金(60971008)资助项目
关键词
BST
择优取向
磁控溅射
形核
BST
preferred orientation
RF-magnetron sputtering
nucleation
