期刊文献+

磁控溅射对锦纶拉伸性能的影响及镀膜形貌观察 被引量:3

Tensile properties affected by magnetron sputtering on nylon yarn and surface morphology observation
在线阅读 下载PDF
导出
摘要 为研究磁控溅射对纺织材料性能的影响,利用JPGF-450I型磁控溅射镀膜机,以锦纶织物为基材,制备纳米铝膜。通过改变溅射功率、工作压强等工艺参数,获得在不同工艺条件下的镀铝膜锦纶织物,测试镀膜后锦纶织物中纱线的断裂强度、断裂功等拉伸性能,研究溅射功率与工作压强对镀膜织物中纱线拉伸性能的影响。结果表明:在室温下,镀膜纱线与原纱相比断裂强度有所提高,断裂强度不匀率降低,断裂功受断裂伸长率影响明显;随溅射功率的增加,镀膜纱线的断裂功和断裂伸长率都呈减小的趋势;工作压强在0.8~0.9Pa时,镀膜纱线的断裂功和断裂伸长率达到最大值。通过AFM原子力显微镜观察了镀膜锦纶织物的表面形态发现,锦纶丝的表面形成了较完整均匀的纳米铝膜。 In order to assess the effect of magnetron sputtering on textile materials,nanometer aluminum thin film was deposited onto nylon fabric by DC magnetron sputtering at room temperature.Sample fabrics were obtained under different parameters including sputtering power and working pressure.By testing the breaking strength and breaking work of the yarn in the coated fabric,the influence of magnetron sputtering power and working pressure on the tensile properties of the yarn in the coated fabric was investigated.Compared with the original yarn's tensile properties,all the coated yarn's breaking tenacity was improved and its CV value was reduced,the breaking work was sensitive to the breaking elongation.With the increasing of sputtering power,both breaking work and breaking elongation decreased.At about 0.8-0.9 Pa,the breaking work and elongation reaches their maximum values.The surface morphology of sputter coated fabric were observed by atomic force microscopy (AFM).It revealed that a complete and uniform nanometer aluminum film was formed on the nylon fabric surface.
出处 《纺织学报》 EI CAS CSCD 北大核心 2010年第5期59-62,共4页 Journal of Textile Research
基金 天津市科技发展计划项目(06YFJZJC14800)
关键词 磁控溅射 铝膜 锦纶 拉伸性能 溅射参数 magnetron sputtering aluminum film nylon tensile property sputtering parameter
  • 相关文献

参考文献11

  • 1SCHOLZ J,NOCKE G,HOLLSTEIN F,et al.Investigations on fabrics coated with precious metals using the magnetrou sputter technique with regard to their anti-microbial properties[J].Surface and Coatings Technology,2005,192:252-256.
  • 2AMOR S B,BAUD G,JACQUET M,et al.Photoprotective titania coatings on PET substrates[J].Surface and Coatings Technology,1998,102:63-72.
  • 3陈颖.金属化纤维织物材料[J].合成纤维工业,1994,17(5):35-38. 被引量:6
  • 4SWANN S.Magnetron sputtering[J].Physics Technology,1988,19(2):67-75.
  • 5余凤斌,夏祥华,于子龙,耿秋菊.磁控溅射镍膜及其性能的研究[J].绝缘材料,2008,41(2):57-59. 被引量:8
  • 6BEHRISCH R,WOLFGANG E.Sputtering by Particle Bombardment[M].Berlin:Springer,2007:110.
  • 7TOWNSEND P D,KELLY J C,HARTLEY N E W.Ion Implantation,Sputtering and Their Applications[M].London:Academic Press,1976.
  • 8温培刚,颜悦,张官理,望咏林.磁控溅射沉积工艺条件对薄膜厚度均匀性的影响[J].航空材料学报,2007,27(3):66-68. 被引量:22
  • 9余平,任雪勇,肖清泉,张晋敏.磁控溅射真空制膜技术[J].贵州大学学报(自然科学版),2007,24(1):68-70. 被引量:19
  • 10KELLY P J,ARNELL R D.Magnetron sputtering:a review of recent developments and applications[J].Vacuum,2000,56:159-172.

二级参考文献24

共引文献50

同被引文献50

引证文献3

二级引证文献37

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部