摘要
电阻阵列是目前发展最快和最有潜力的红外场景产生技术,可以满足大温度范围、高空间分辨率的要求。非均匀性是影响电阻阵列红外图像生成质量的一个重要因素。论述了非均匀性的成因和采取的一些措施,提出了一种改进的稀疏网格非均匀性修正方法,详细地描述了它的工作过程和原理。研究了非均匀性修正中电阻阵列响应特性的测量,给出了电阻阵列测试数据的处理和修正表格制备方法。对修正方法进行了数字仿真,结果表明:该方法可明显改善电阻阵列的非均匀性,提高成像质量。
Resistor array is treated as an infrared scene generation technique with the fastest development speed and the greatest potential nowadays. It can meet the demand for wide temperature range and high spatial resolution.The nonuniformity （NUC） is one of the most important factors that greatly affect the quality of the infrared images projected with resistor array. The causes and the adopted measures of the NUC were analyzed and discussed. An improved method of sparse grid nonuniformity correction was presented. The new method paid more attention to the measurement intensity, the measurement environment requirement and the real time quality. Compared with the existed methods, the new method could provide well performance with low cost and was more suitable for practical use. Its working procedure and principle were described. Research on the measurement of emitter response was done. The method of measurement data processing and the preparation of NUC table were given. The digital simulation of the NUC method was done. The result indicates that the method evidently improve the NUC feature of resistor array and imaging quality.
出处
《红外与激光工程》
EI
CSCD
北大核心
2009年第4期604-608,共5页
Infrared and Laser Engineering
基金
某院重点平台建设项目(WX07233)
关键词
电阻阵列
动态红外场景投射器
非均匀性修正
稀疏网格
Resistor array
Dynamic infrared scene projector
Nonuniformity correction
Sparse grid
