摘要
采用X射线衍射和X射线光电子能谱实验手段对不同厚度的NiTi薄膜相变温度的变化进行了分析.结果表明在相同衬底温度和退火条件下,3μm厚度的薄膜晶化温度高于18μm厚度的薄膜.衬底温度越高,薄膜越易晶化,退火后薄膜奥氏体相转变温度As越低.薄膜的表面有TiO2氧化层形成,氧化层阻止了Ni原子渗出;膜与基片的界面存在Ti2O3和NiO.由于表面和界面氧化层的存在,不同厚度的薄膜内层的厚度也不同,因而薄膜越薄,Ni原子的含量就越高.Ni原子的含量的不同会影响薄膜的相变温度.
The effect of thickness on transformation temperature of the NiTi thin films has been studied by X-ray diffraction and X-ray photoelectron spectroscopy.Results show that the crystallization temperature for 3μm-thick film is higher than that for 18μm thick film at the same growth temperature and post annealing.With the substrate temperature increasing,the start temperature（As）of austenite phase is lowered after annealing at 763K for 1h.There is an oxide layer（TiO2）on the film surface,which prevents the Ni atom from coming onto the surface.There is an oxide layer of a mixture Ti2O3 with NiO on the film /substrate interface.The oxide layers affect the transformation temperature by changing the Ni atomic content in the interior of the film.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2009年第4期2742-2745,共4页
Acta Physica Sinica
基金
哈尔滨工程大学科研启动金(批准号:HEUFT08035)
国家博士后科学基金(批准号:20060390432)
黑龙江省博士后科研启动资助金(批准号:LBH-Q08123)资助的课题~~
关键词
NiTi合金薄膜
X射线衍射
相变
X射线光电子能谱
NiTi alloy film,X-ray diffraction,phase transformation,X-ray photoelectron spectroscopy
