摘要
三价铬电镀过程中六价铬离子对镀层质量的影响很大,因此研究电镀过程中六价铬的积累及消除对三价铬电镀液的维护和产品质量保证具有重要意义。研究了氯化物体系三价铬镀液中六价铬的积累规律和相应的改进措施,分别比较了添加剂A(含c=c双键的有机醛类化物)和溴化铵对六价铬生成速度的影响。结果表明,5g/L稳定剂A或溴化铵均能降低六价铬的生成速度。同时采用添加4g/L稳定剂A或溴化铵、过氧化氢还原和1A/dm2小电流电解的方法对六价铬进行去除,经测试效果良好。
Since Cr(Ⅵ)has great effect on the quality of electroplated trivalent chromium coating,it is imperative to study the accumulation and elimination of Cr(Ⅵ)from the bath for trivalent chromium elec-troplating in terms of the maintenance of the bath and control of the coating quality.Thus the accumulation rule of Cr(Ⅵ)and corresponding measures to eliminate Cr(Ⅵ)in chloride baths were studied.And the effects of two kinds of stabilizing agents on the formation rate of Cr(Ⅵ)were compared.Results indicated that the introduction of 5 g/L stabilizing agent A or ammonium bromide contributed to decrease the formation rate of Cr(Ⅵ).And Cr(Ⅵ)could be well eliminate by introducing 4 g/L stabi-lizing agent A or ammonium bromide in association with reduction by H2O2 and electrolysis at a small current density of 1 A/dm2.
出处
《材料保护》
CAS
CSCD
北大核心
2009年第2期74-76,共3页
Materials Protection
关键词
三价铬电镀
氯化物
六价铬离子
稳定剂
去除
trivalent chromium plating
chloride
hexavalent chromium
stabilzers
elimination
