摘要
采用阴极电沉积的方法在导电玻璃上制备了ZnO薄膜。研究了沉积电流对薄膜结构特性和光学特性的影响。XRD分析表明ZnO薄膜为纤锌矿结构,晶粒尺寸随电流的增大而增大,择优取向随电流的变化发生了转变。光学测试表明样品的透射率最大值可达84%,禁带宽度随电流变化不大,接近于3.3 eV。
ZnO thin films were prepared by electrodepositing method on transparent conducting glass substrates.The influence of deposition current on the structure and optical properties of the films was studied.XRD analysis demonstrated that the nanocrystalline ZnO thin films had wurtzite structure,the grain size of the samples decreased with the increase of the deposition current,and the preferential orientation of the film changed with the increase of the deposition current value.Optical characterizations showed that the maximum value of optical transmittance of the films was up to 84%, and the optical bandgap energy value was about 3.3 eV,irrespective of the cathodic current value.
出处
《半导体光电》
EI
CAS
CSCD
北大核心
2007年第1期83-86,共4页
Semiconductor Optoelectronics
