摘要
通过理论推导,构建了抗蚀剂的感光特性、光源的光效与曝光量之间的数学模型,为液晶光阀代替穿孔带提供了理论依据·结合液晶光阀的工作原理和光刻快门的控制原理,对液晶光阀组的控制进行了研究并给出了其控制电路图.通过实际光刻试验,自控液晶光阀组光刻快门机构可以完成编码图案的控制,通光控制达到了预计要求,刻出的图案清晰,线条陡直.证明液晶光阀组替代穿孔带用作光刻快门是完全可行的·
In order to obtain patterns of code disc and metrology grating which are the core components of optical shaft encoder, photolithography shutter is usually used to control exposure. But perforated film as photolithography shutter has many disadvantages such as taking too long time to perforate, easily making wrong code. A mathematical model between resist property, luminous efficiency and exposure has been established by deducing their relations for avoiding the disadvantages. The theory of using liquid crystal light valve replacing proforated film is proposed. Based on operating principles of liquid crystal light valve and control theories of photolithography shutter, the control circuit of liquid crystal light valve arrays has been designed according to theirs control principles. The photolithographic experiments show that, the patterns of code disc are good, the edges of lines are vertical. It indicates that the liquid crystal light valve arrays as photolithography shutter can control exposure and light passing accords with the intending requires. It proves that using liquid crystal light valve arrays replacing perforated film as photolithography shutter is feasible completely.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2006年第5期783-786,共4页
Acta Photonica Sinica
基金
中国科学院长春光机与物理所第三届青年创新基金(No.Q03G04Z)资助项目
关键词
液晶光阀组
光刻快门
感光特性
光效
曝光量
控制电路
Liquid crystal light valve arrays
Photolithography shutter
Sensitive property
Luminous efficiency
Light exposure
Control circuit
