摘要
目前,国内控制码盘、计量光栅图案刻制的机构是快门,原有的穿孔带式快门有很多缺点,为了避免这些缺点,对液晶光阀作为快门的可行性进行了研究。通过对抗蚀剂的感光特性、光源的光效与曝光量之间的关系进行理论推导,构建了它们之间的数学模型,对液晶光阀的特性进行分析并进行了曝光控制实验,为设计一种智能型液晶光阀曝光控制装置提供了理论依据。
In order to obtain pattern of code disc and metrology grating, photolithography shutter is usually used to control exposure. But perforated film as photolithography shutter has many disadvantages. The feasibility of liquid crystal light valve as photolithography shutter is researched for avoiding the disadvantages. A mathematical model between resist property, luminous efficiency and exposure has been established by deducing their relations. In this paper, the properties of liquid crystal light valve are analyzed,the exposure experiment under control of liquid crystal light valve is made and the theoretical basis of designing an intellectualized device controlling exposure by liquid crystal light valve is given.
出处
《液晶与显示》
CAS
CSCD
2004年第6期468-471,共4页
Chinese Journal of Liquid Crystals and Displays
基金
中国科学院长春光学精密机械与物理研究所第三届青年创新基金(No.Q03G04Z)
关键词
液晶光阀
光刻快门
感光特性
光效
曝光量
liquid crystal light valve
photolithography shutter
sensitive property
luminous efficiency
light exposure
