摘要
Extreme ultraviolet lithography(EUVL)and electron beam lithography(EBL)are considered to be crucial lithography techniques utilized in the fabrication of nanoscale semiconductor devices.However,the industry currently faces a scarcity of EUV photoresists that meet the increasingly challenging standards in terms of resolution,sensitivity and roughness.Metal oxo nanoclusters have garnered significant interest in the field of EUV photoresist due to their relatively stronger absorption cross-section for extreme ultraviolet light and lower dimensions.In this study,we utilize a heterometallic nanocluster strategy by a combination of titanium and zirconium metals to investigate their solubility,assess the suitability of various developers,and evaluate their performance in electron-beam and EUVL,as well as study their etch resistance for pattern transfer.We demonstrate that R-4 is able to get a critical dimension(CD)of 25 nm at low doses under EBL,as well as 50 nm resolution at EUVL with a remarkable sensitivity of 19.7 mJ cm−2.This study offers an efficient heterometallic method for optimizing the lithographic performance of metal oxo nanocluster photoresists,which can benefit the development of commercially viable next-generation EUV photoresists.
极紫外光刻(EUVL)和电子束光刻(EBL)被认为是制造纳米级半导体器件的关键光刻技术.然而,随着业界对分辨率、灵敏度和粗糙度等方面的要求日益提升,开发符合产业界需要的极紫外光刻胶仍面临着挑战.近年来,金属氧簇光刻胶因其对极紫外光的高吸收截面和纳米级均一尺寸,在EUV光刻领域引起了广泛关注.在本研究中,我们采用混金属策略合成了四种钛锆氧簇光刻胶,并详细研究了它们的溶解性、显影剂的选择、电子束和极紫外光刻性能、复杂图案转移能力以及相比硅的蚀刻选择性.研究结果表明,R-4光刻胶在低剂量电子束下可实现25 nm的特征尺寸,而在EUV光刻测试中,19.7 mJ cm^(−2)的灵敏度即可获得50 nm的分辨率.本研究提出了一种通过混金属策略优化金属氧簇光刻胶性能的方法,为下一代商用EUV光刻胶的开发提供了新的思路.
作者
Yang Qiao
Guangyue Shi
Ou Zhang
You Li
Michaela Vockenhuber
Yasin Ekinci
Feng Luo
Lei Zhang
乔洋;史广月;张鸥;李尤;Michaela Vockenhuber;Yasin Ekinci;罗锋;张磊(School of Materials Science and Engineering,Nankai University,Tianjin 300350,China;Institute of Modern Optics,College of Electronic Information and Optical Engineering,Nankai University,Tianjin 300350,China;Paul Scherrer Institute,Laboratory for Micro and Nanotechnology,Villigen CH-5232,Switzerland)
基金
supported by the National Natural Science Foundation of China(22271284 and 91961108)
“the Fundamental Research Funds for the Central Universities”,Nankai University(075-63233091)。
