摘要
采用直流反应磁控溅射法,通过改变反应气体N2分压(5%、10%、20%、30%、40%、50%、60%),在SiO2/Si(111)基片上制备ZrN薄膜。利用XRD、SEM、EDS分析了薄膜的物相、结构、形貌以及成分,使用分光光度计测量了薄膜的反射光谱,并进一步确定了薄膜颜色在L*a*b*色度坐标中的位置,研究了氮分压对薄膜颜色的影响,以及ZrN薄膜颜色与薄膜成分、结构之间的关系。分析结果表明:在不同的氮分压下,ZrN薄膜具有较好的成膜质量;随着氮分压的增加,薄膜沉积速率降低、N含量增加;薄膜结晶度先升高后降低、且在氮分压为10%时,薄膜出现(111)的择优取向;薄膜颜色随薄膜成分结构的改变而发生明显的变化(颜色由银色向金色、暗金、深褐色以及非本征颜色转变)。当反应气体N2分压较低时,分压的增加使得锆与氮更容易键合,导致薄膜中N含量增加,使ZrN结晶度增大并出现择优取向。当N2分压超过10%后,薄膜中多余的氮处于晶格的间隙位置,使得薄膜晶格间距变大且结晶度降低,薄膜成分结构的改变导致了薄膜颜色的变化。
Zirconium nitride thin films were deposited on SiO2/Si(111) substrates by direct current(DC) reactive magnetron sputtering of a zirconium target with different nitrogen ratio(5%, 10%, 20%, 30%, 40%, 50%, 60%). The structure, morphology and composition of films were determined by XRD, SEM and EDS analysis. The reflection spectrum of the films was obtained by using a spectrophotometer, and the coordinates of L*a*b*chromaticity were further determined. The effect of nitrogen partial pressure on the color of Zr N films and the relationship between the color and the composition and structure of ZrN films were studied. The experimental results show that all films are compact and homogeneous with increasement of nitrogen ratio. While the deposition rate decreased, the nitrogen content of the ZrN films increased, the crystallinity of the films increased first and then decreased, and the preferred(111) orientation of the films appeared with the nitrogen ratio of 10%. The film color changed significantly with the changing of the composition and structure of the films(from light gold to gold, dark gold, dark brown and non-intrinsic color). When the reaction gas N2 is low, the zirconium and nitrogen atoms bonded easily with the increasing of nitrogen ratio. Naturally, the content of N in the films increased, and the crystallinity of ZrN increased and the preferred orientation appeared.When the nitrogen ratio over 10%, the excess nitrogen atoms in the interstitial positions of crystal makes the lattice distance larger and the crystallinity decreased. The film color also changed with the changing of composition and structure of the films.
作者
吴键坤
李兆国
彭丽萍
易勇
张继成
WU Jian-kun;LI Zhao-guo;PENG Li-ping;YI yong;ZHANG Ji-cheng(School of Materials Science and Engineering,Southwest University of Science and Technology,Mianyang 621000,China;Research Center of Laser Fusion,China Academy of Engineering Physics,Mianyang 621000,China)
出处
《真空》
CAS
2021年第1期57-62,共6页
Vacuum
基金
国家自然科学基金(编号:11604310)
国家自然科学基金(编号:21875061)
环境友好能源材料国家重点实验室自主课题资助(编号:237/19fksy08,1)。
关键词
氮化锆薄膜
磁控溅射
成分与结构
色度
zirconium nitride
magnetron sputtering
composition and structure
chroma
