摘要
综述了二氧化硅(SiO2)薄膜的制备方法和研究进展,介绍了磁控溅射、溶胶凝胶法和真空镀等SiO2薄膜制备方法及其优缺点,论述SiO2薄膜在光学、电学和光电等性能研究方面的新进展,最后对SiO2薄膜的应用和发展进行了展望.
The preparation methods and the research progress of SiO2 film were reviewed.Some kinds of preparation methods of SiO2 film and their advantages and disadvantages such as electrochemical deposition,vacuum deposition method,magnetron sputtering and molecular beam epitaxy were introduced.In addition,research progress on properties of SiO2 film such as optical,electrical and photoelectrical properties were introduced.Finally,the applications and development of SiO2 film were prospected.
作者
俞立宸
季鑫
高磊
顾雁豪
周晟吉
YU Lichen;JI Xin;GAO Lei;GU Yanhao;ZHOU Shengji(School of Mathematics,Physics and Statistics,Shanghai University of Engineering Science,Shanghai 201620,China)
出处
《上海工程技术大学学报》
CAS
2019年第3期215-218,277,共5页
Journal of Shanghai University of Engineering Science
基金
上海工程技术大学大学生创新资助项目(cx1821007)
关键词
SIO2薄膜
制备方法
磁控溅射
光学性能
SiO2 film
preparation method
magnetron sputtering
optical property
