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基于全因子实验设计的离子抛光工艺研究 被引量:11

Research on cross-section ion polishing process based on full factorial experiments design
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摘要 材料学院检测分析中心利用离子抛光设备在电镜制样服务中发现,金属基复合材料的送样率很高,但缺乏标准制样工艺研究。本文针对钛基复合材料,设计了离子抛光两因素四水平的全因子试验。两因素分别为加速电压和抛光时间,其中加速电压的水平为3 kV、4 kV、5 kV和6 kV,抛光时间为2 h、4 h、6 h和8 h。抛光宽度、抛光深度和抛光面积为离子抛光形态主要的表征参数。观察不同抛光工艺参数条件下的抛光形态,并利用软件对抛光成形参数进行量化和对比计算。利用方差分析验证了主效应和交互效应的模型准确性,并对离子抛光的成形参数进行了回归分析和范围预测。该研究可以为材料离子抛光工艺提供检测服务案例,建立标准制样工艺,以减小实验周期和成本,提高电镜制样效率。 A high sample preparation rate of the metal-based composite materials by the ion polishing method was found in the Materials Testing and Analysis Center. In view of the lack of standardization process research on the cross-section polishing, a two-factor (polishing voltage and polishing time) and four-level full factorial experiment was designed by cross-section ion polishing method. The polishing voltage level is set as 3 kV, 4 kV, 5 kV and 6 kV, and the polishing time is 2 h, 4 h, 6 h and 8 h. Polishing shape parameters mainly include polishing width, polishing depth and polishing area. Macroscopic metallography under different polishing parameters was compared, and the shape parameters were calculated by image processing. The variance test was used to verify the correctness of the main effect and the interaction effect model. The regression analysis and range prediction of the shape parameters were obtained. This research can provide test service cases for the ion polishing process, establish a standard sample preparation to reduce the experimental cycle and cost, and improve the efficiency of electron microscope sample preparation.
作者 马晓丽 刘礼 王立强 李晓玲 曹力军 MA Xiao-li;LIU Li;WANG Li-qiang;LI Xiao-ling;CAO Li-jun(School of Materials Science and Engineering,Shanghai Jiao Tong University,Shanghai 200240;Yungtay Elevator Equipment (China) Co. Ltd.,Shanghai 201615,China)
出处 《电子显微学报》 CAS CSCD 北大核心 2019年第3期276-280,共5页 Journal of Chinese Electron Microscopy Society
基金 上海交通大学决策咨询课题重点课题(No.JCZXSJA2018-001)
关键词 加速电压 抛光时间 抛光宽度 抛光深度 抛光面积 polishing voltage polishing time polishing width polishing penetration polishing area
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