摘要
采用等离子体基低能氮离子注入技术对纯Ti试样进行表面处理,研究了氮离子注入改性层在3. 5%Na Cl溶液中的耐点蚀性能及钝化膜的稳定性.结果表明:等离子体基低能氮离子注入纯Ti试样表面形成了厚度约为2μm的Ti2N相改性层;在3. 5%Na Cl溶液中,与金属Ti相比,Ti2N相改性层电化学交流阻抗谱(EIS)的容抗弧直径及|Z|值增加,相位角平台变宽,利用等效电路Rs-(Rp//CPE)拟合的电极电阻由6. 44×104Ω·cm2增大至2. 26×105Ω·cm2,电极反应阻力增大,耐点蚀性能提高.随着浸泡时间的增加,Ti2N相改性层钝化膜电阻相近,皆保持在105Ω·cm2量级,呈现良好的稳定性.
The surface of pure Ti was modified by plasma-based low energy nitrogen ion implantation. The pitting corrosion resistance and the stability of passive film for nitrided layer in 3. 5% NaCl solution were investigated. The results indicate that the surface of the nitrogen ion implanted pure Ti is Ti2 N phase modifying layer with the thickness about 2 μm. Comparing with pure Ti,the electrochemical impedance spectroscopy（EIS） of the Ti2 N phase modify layer in 3. 5% NaCl solution has the larger diameter of capacitive arc. With increasing impedance modulus ｜ Z ｜,the phase degree range is wider,and the resistant Rpis increased to 2. 26 × 10^5Ω·cm2 from 6. 44 × 10^4Ω·cm2 by using an equivalent electric circuit of Rs-（Rp//CPE）,so the pitting corrosion resistance is increased. With immersion times increasing,the similar risistance of the passive film formed on Ti2 N layer is about 105 ohm,and it is stablized.
作者
杨旭
夏飞
朱雪梅
YANG Xu;XIA Fei;ZHU Xuemei(School of Materials Science and Engineering,Dalian Jiaotong University,Dalian 116028,China)
出处
《大连交通大学学报》
CAS
2018年第5期38-41,共4页
Journal of Dalian Jiaotong University
关键词
等离子体基低能氮离子注入
金属Ti
点蚀
电化学交流阻抗谱(EIS)
plasma-based low energy nitrogen ion implantation
pure Ti
pitting corrosion resistance
electro-chemical impedance spectroscopy （EIS）
