摘要
Pixelated micropolarizer arrays （PMAs） have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320 × 240 aluminum PMA with 7.4 μm pitch is successfully fabricated by the proposed technique. The period of the grating is 140nm, and the polarization directions of each of the 2 × 2 units are 0°, 45°, 90°, and 135°. The scanning electron microscopy and optical microscopy results show that the PMA has a good surface characteristic and polarization performances. When the PMA is applied to phase-shifting interferometry, four fringe patterns of different polarization directions are obtained from only one single frame image, and then the object wave phase is calculated in real time.
Pixelated micropolarizer arrays （PMAs） have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320 × 240 aluminum PMA with 7.4 μm pitch is successfully fabricated by the proposed technique. The period of the grating is 140nm, and the polarization directions of each of the 2 × 2 units are 0°, 45°, 90°, and 135°. The scanning electron microscopy and optical microscopy results show that the PMA has a good surface characteristic and polarization performances. When the PMA is applied to phase-shifting interferometry, four fringe patterns of different polarization directions are obtained from only one single frame image, and then the object wave phase is calculated in real time.
基金
Supported by the National Basic Research Program of China under Grant No 2011CB302105, the National Natural Science Foundation of China under Grant Nos 11332010, 11102201, 11127201, 11472266 and 11372300, and the Instrument Developing Project of the Chinese Academy of Sciences under Grant No YZ201265.
