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The Gas Nucleation Process Study of Anatase TiO_2 in Atmospheric Non-Thermal Plasma Enhanced Chemical Vapor Deposition 被引量:1

The Gas Nucleation Process Study of Anatase TiO_2 in Atmospheric Non-Thermal Plasma Enhanced Chemical Vapor Deposition
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摘要 Abstract The gas phase nucleation process of anatase TiO2 in atmospheric non-thermal plasma enhanced chemical vapor deposition is studied. The particles synthesized in the plasma gas phase at different power density were collected outside of the reactor. The structure of the collected particles has been investigated by field scanning electron microscope (FESEM), X-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM) and selected area electron diffraction (SAED). The analysis shows that uniform crystalline nuclei with average size of several nanometers have been formed in the scale of micro second through this reactive atmo- spheric plasma gas process. The crystallinity of the nanoparticles increases with power density. The high density of crystalline nanonuclei in the plasma gas phase and the low gas temperature are beneficial to the fast deposition of the 3D porous anatase TiO2 film. Abstract The gas phase nucleation process of anatase TiO2 in atmospheric non-thermal plasma enhanced chemical vapor deposition is studied. The particles synthesized in the plasma gas phase at different power density were collected outside of the reactor. The structure of the collected particles has been investigated by field scanning electron microscope (FESEM), X-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM) and selected area electron diffraction (SAED). The analysis shows that uniform crystalline nuclei with average size of several nanometers have been formed in the scale of micro second through this reactive atmo- spheric plasma gas process. The crystallinity of the nanoparticles increases with power density. The high density of crystalline nanonuclei in the plasma gas phase and the low gas temperature are beneficial to the fast deposition of the 3D porous anatase TiO2 film.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第1期32-36,共5页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(Nos.10835004 10775031 and 11375042) Shanghai Municipal Committee of Science and Technology of China(10XD1400100) Outstanding Young Investigator Award(No.11005017)
关键词 gas phase nucleation TiO2 nanoparticles plasma enhanced chemical vapordeposition (PECVD) 3D nanostructured films atmospheric pressure gas phase nucleation, TiO2 nanoparticles, plasma enhanced chemical vapordeposition (PECVD), 3D nanostructured films, atmospheric pressure
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