摘要
用磁控溅射法在奥氏体不锈钢上分别制备了SiC单层膜和Al2O3/SiC双层膜,研究了溅射气压,溅射功率以及退火温度对性能的影响。对比了二者的结构、硬度以及耐腐蚀性。结果表明,Al2O3缓冲层降低了SiC薄膜与奥氏体不锈钢基底的热失配和晶格失配,减少了因其而产生的缺陷,从而改善了奥氏体不锈钢上SiC薄膜的结晶质量。
The SiC monolayer thin film and Al2O3/SiC bilayer thin film were prepared on austenitic stainless steel by magnetron sputtering method, and the effects of sputtering pressure, sputtering power and annealing temperature on the film properties were investigated. Their structure, hardness and corrosion resistance were contrasted and the results show that Al2O3 buffer layer decreases the hot and lattice mismatch between the SiC film and austenitic stainless steel, thus improves the crystallization quality and properties of the SiC thin film on anstenitic stainless steel.
出处
《真空》
CAS
2012年第1期48-51,共4页
Vacuum
基金
国家"973"项目(2008CB717802)
安徽省自然科学基金(090414182
11040606M63)
安徽省高校自然科学基金(KJ2009A091)
