摘要
为改善X射线晶体密度法测得的阿伏伽德罗常数的标准不确定度,研制了一种基于光谱椭偏术和二维Si球扫描机构的Si球表面氧化层厚度自动扫描测量系统,用于测量直径约93.6 mm、质量约1 kg的单晶Si球表面氧化层平均厚度。用本文系统对标准Si球表面进行400点扫描测量实验,得到氧化层厚度分布,且测得其平均厚度为6.00(22)nm。测量结果可将由氧化层导致的阿伏伽德罗常数测量相对不确定度降低至2.5×10-8。
In order to improve the standard uncertainty of Avogadro constant determined by the X-ray crystal density method,an automatic scanning measurement system based on the spectroscopic ellipsometry and the two-dimensional silicon（Si） sphere scanning mechanism is proposed,which is used for determining the thickness of the oxide layer on a single crystal silicon sphere with the diameter of 93.6 mm and the mass of 1 kg approximately.By measuring the oxide layer thickness at 400 points on the standard silicon sphere,the thickness distribution of the oxide layer is obtained and the mean thickness is 6.00（22） nm.The relative standard uncertainty of Avogadro constant caused by the uncertainty of the oxide layer thickness can be reduced down to 2.5×10-8.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2011年第9期1376-1379,共4页
Journal of Optoelectronics·Laser
基金
清华大学自主科研计划资助项目(2009THZ06057)
关键词
测量
氧化层
光谱椭偏
扫描机构
Si球
measurement
oxide layer
spectroscopic ellipsometry
scanning mechanism
silicon（Si） sphere
