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基于Geant4模拟质子在半导体Si材料中的NIEL值 被引量:8

Simulation of proton NIEL in silicon by using GEANT4
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摘要 利用蒙特卡洛软件GEANT4模拟了质子对半导体Si材料的位移损伤效应的能量损失。根据反冲原子的能量,引入反冲原子能量Lindhard-Robinson-Akkerman分离函数,模拟结果表明10 MeV-1 GeV能量范围内的质子位移能量损失值和Jun、Summers等结果吻合较好。 In this paper,the displacement damage of energetic protons in semiconductor material of silicon is simulated using the MC software of GEANT4.The results shows a good agreement of proton NIEL(non-ionizing energy loss) value in the proton energy range from 10 MeV to 1 GeV with Jun et al and Summers/Burke et al.,who applied the Lindhard-Robinson-Akkerman partitioning functions according to energy of the recoil atoms.
出处 《核技术》 CAS CSCD 北大核心 2011年第7期529-531,共3页 Nuclear Techniques
关键词 GEANT4 蒙特卡罗 反冲原子 位移能量损失 GEANT4 Monte Carlo Recoil Atoms NIEL
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