摘要
用用性气体（Ne＋、Xe＋）离子束辅助沉积（IBAD）技术，合成了金红石型氧化钛薄膜在薄膜生长过程中，离子束以45°角轰击薄膜．通过增加离子原子到达比γ，实现了金红石型氧化钛薄膜从（110）择优取向向（100）择优取向的转变研究了取向转变的机制，择优取向的转变是表面能和沟道效应竞争的结果估算了晶面的表面能，发现（110）面具有最小的表面能当γ较小时，表面能控制薄膜的取向，此时薄膜表现为具有最小表面能的晶面（110）择优生长；随着γ的增加。
Rutile-type titanium dioxide films were synthesized by ion beam assisted deposition with ion beam incidence inclined 45°to the substrate. The influence of ion bombardment during deposition on the preferred orientation of films was studied. A change of preferred orientation from (110) to (200) with the increase of ion to deposited atom arrival ratio ac was observed in case Ne+ and Xe+ ion bombardment were used during film groWth respectively. The preferred orientation of titanium oxide films from (110) to (200) is accounted for in terms of channeling of ions and surface free energy. When arrival ratio of ion to atom is low, crystallites with (110) orientation which has lowest sudece free energy grow preferentially. As the increase of 7, the damage induced by ion bombardment compresses the growth of crystallites with shallow ion channeling. Then (200) preferred orientation is observedbecause of its wider ion channeling.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
1999年第6期581-586,共6页
Chinese Journal of Materials Research
