摘要
着重阐述了三价铬的发展历史、电镀工艺、阴极反应机理及电镀中存在的问题。对于当前镀铬中存在的问题,从电镀体系的选择、配位剂的选择、阳极及电镀电源的选择、pH值的影响等方面进行了分析与总结。最后对三价铬电镀的发展作了展望。
A review was provided of the histo-ry,electroplating technology,cathodic reaction mechanism and existing problems in trivalent chromium electroplating. The exist-ing problems were analyzed and discussed in the light of selection of electroplating system,complexing agent,anode and power source as well as the influence of pH value. Finally,the develop-ment of trivalent chromium electroplating was prospected.
出处
《材料保护》
CAS
CSCD
北大核心
2010年第4期29-32,共4页
Materials Protection
关键词
三价铬电镀
反应机理
发展状况
trivalent chromium electroplating
reaction mecha-nism
current status of research
