摘要
介绍了激光物理气相沉积设备的研制及利用所研制的设备和CO2气体激光器在Ni与SiO2基片上沉积Al2O3薄膜的方法．探索了激光物理气相沉积Al2O3薄膜的工艺，分析了Al2O3膜层的结构并初步测试了膜层的绝缘性、高温抗氧化性及耐腐蚀性．
An introdution to research on laser PVD equipment and its manufacture arepresented. Using this equipment and 1.5 kW continue wave CO2 laser. the deposition ofAl2O3 film on substrate of Ni and SiO2 is realized. The process factors, such as theinfluence of the substrate temperature, the pressure in the vaccum chamber and the laserpower on deposition rate of the film are discussed. In order to identify the filmstructure, X-ray refraction analysis is made, and the nibal result shows that thefilm structure is amorphous. Also the property of the film is studied.
出处
《北京工业大学学报》
CAS
CSCD
1998年第3期106-109,共4页
Journal of Beijing University of Technology
