摘要
利用直流或射频磁控溅射法溅射沉积非晶NiTi合金薄膜研究了550℃晶化热处理0．5h的51．6％Ni－Ti形状记忆薄膜的力学性能．弯曲和拉伸实验结果表明：自由状态的NiTi薄膜具有良好的形状记忆效应．形状记忆的恢复率几乎接近100％．与相同组分和相同热处理条件下的块体合金材料的形状记忆性能的实验数据相比较是相当的．
The amorphous NiTi thin films were fabricated by dc/ac magnetron sputtering.Mechanical properties of 51.6%Ni-Ti thin films annealed at 550 ℃ for 0.5 h were studied. Bend deformation and stress/strain experimental results indicated that the free-standing NiTi thin films have good shape memory effect, and the recovery rate of shape memory was nearly 100%. The shape memory properties of the film and bulk NiTi alloy are approximately at the same level.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1998年第2期119-112,共1页
Acta Metallurgica Sinica
基金
国家自然科学基金!59672024
