摘要
以对甲基苯磺酸钠(p-TSNa)为掺杂剂在不锈钢电极表面恒电位合成聚吡咯(PPy)修饰膜,采用循环伏安法在-1.6-0.8V大范围扫描研究了修饰膜在H2SO4、Na2SO4、NaOH电解质溶液中的氧化还原行为.结果表明,在H2SO4溶液中,以H+的脱出(氧化)/嵌入(还原)为特征,并发现聚吡咯在酸性溶液中所特有的质子还原峰.在Na2SO4和NaOH溶液中,以Na+的脱出(氧化)/嵌入(还原)峰为特征.FT-IR吸收光谱显示,经NaOH处理后,聚吡咯膜的长共轭结构被完全破坏,而经H2SO4和Na2SO4处后,膜的共轭结构未发生变化.
Polypyrrole （PPy） films were synthesized by potentiolstatic method from a para-toluenesulfonic sodium （p-TSNa） solution on stainless steel. Cyclic voltammetry of PPy-modified electrodes in the wide potential range from -1.6 to 0.8 V was conducted in H2SO4, Na2SO4, and NaOH solutions, respectively. The results showed that cyclic voltammogram in H2SO4 solution was featured by H^＋ insertion during reduction process and H^＋ expulsion during oxidation process. A unique peak associated to H^＋ reduction was first discovered. In Na2SO4 and NaOH solutions, cyclic voltammograms are featured by Na^＋ insertion during reduction process and Na＋ expulsion during oxidation process. The data of FT-IR absorption spectra demonstrated that NaOH treatment had made extensive structure degradation, but Na2SO4 and H2SO4 treatments had not made conjugated structure changes on PPy films.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
2008年第4期612-618,共7页
Acta Physico-Chimica Sinica
