摘要
综述了ITO薄膜的半导化机理、应用和制备工艺。ITO薄膜的半导化机制是高价Sn^(4+)替代部分In^(3+)和氧缺位。ITO薄膜主要用于光电器件中,例如用于液晶显示。综述了磁控溅射、CVD、喷雾热分解和溶胶-凝胶四种制膜工艺。
The semiconducting mechanism, applications and fabrication techniques of
ITO films are reviewed. The semiconducting mechanism of ITO is attributed to doping with Sn4+ and to oxygan vacancies. The semiconducting transparent ITO films are mainly used in optical-electrical devices such as LCD (liquid crystal display) device. Various fabrication techniques cur-rently in use, including magnetron sputtering, CVD, sol-gel, spray-pyrolysis, are discussed.
出处
《材料导报》
EI
CAS
CSCD
北大核心
1997年第4期11-14,共4页
Materials Reports
