摘要
将TiO2光催化剂固化在高压绝缘子表面形成无机防污闪薄膜,用XRD、UV-Vis、FT-IR和SEM表征和测试了薄膜的结构和光催化活性,比较了高压绝缘子涂覆光催化薄膜前后电气性能的变化和实挂的积污情况．结果表明,镀膜后的绝缘子电气性能变化不大,挂网6个月后样品表面的灰密值为镀膜前的1／35．在满足电气性能的前提下,镀膜后的绝缘子具有良好的光自洁能力和防污闪性能．
TiO2 photocatalyst was coated and solidified on the insulator surface to form a film with anti-pollution-flashover function. The coating technology was explored, and XRD, UV-Vis, SEM and FT-IR were employed to characterize the film structure and test its photocatalytic activity. The electric property and the non-soluble deposit density （NSDD） on line were also tested, respectively. Comparing with the insulator without film, the electric property of the insulator with the film was not changed remarkably. The value of NSDD for the insulator with the film was 1/35 of that without film after six months hanging. The insulator with the film displays a good photocatalytic self-cleaning capability while satisfying the basic electric performance, and a function of anti-pollution-flashover.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
2007年第2期166-170,共5页
Chinese Journal of Materials Research
基金
国家自然科学基金20473017
福建省科技专项基金2005K001
卫生部科学研究基金-福建省卫生教育联合攻关计划WKJ2005-2-016
福建省环保重点项目资助项目
关键词
无机非金属材料
防污闪绝缘子
薄膜
光自洁
inorganic non-metallic materials, anti-pollution-flashover insulator, films, photocatalytic self-cleaning
