摘要
介绍了用磁控溅射法制备Au／Gd（金／钆）多层膜的初步实验结果。在摸索出的工艺条件下，采用计算机定时控制膜厚的方法，按照设计的周期结构（设计周期厚度10nm．Au／Gd=5nm／5nm，总周期数为25）制备了界面清晰、表面光滑的多层膜样品。X—Ray衍射仪小角衍射测试的周期厚度为9、95nm.和设计值十分吻合，原子力显微镜（AFM）的检测表明，薄膜的表面粗糙度小于1、7nm。
The experiment result of fabrication Au/Gd muhilayer film by magnetron sputtering is described in this paper. Using computer controlled timing method, designed period structure（ d = 10nm, Au/Gd = 5nm/5nm, n = 25 ）has been automatically deposited on Si surface under appropriate working conditions. The result of X-Ray small angle diffraction and atom force microscope test show that the film＇s period depth is 9. 95nm and the film＇s surface roughness is less than 1.7nm
出处
《材料导报》
EI
CAS
CSCD
北大核心
2005年第F05期81-82,86,共3页
Materials Reports
基金
国家863计划项目资助课题（10075040）
