摘要
为了防止玻化ＳｉＯ２－Ｎａ２Ｏ－Ｂ２Ｏ３结合剂烧结时对立方氨化硼（ｃＢＮ）的侵蚀，并实现ｃＢＮ晶体与结合剂间的化学键结合，本文用ＤＴＡ、ＸＲＤ、ＳＥＭ、ＥＰＭＡ等研究了Ｔｉ镀层与ＣＢＮ界面在６００～１２００℃温度范围的界面反应过程及界面成分结构特征，讨论了镀ＴｉｃＢＮ与结合剂复合体在烧结过程中的成分结构及性能．结果表明：Ｔｉ镀层与ｃＢＮ晶体在６００℃以上，以反应扩散的形式发生界面反应形成ＴｉＮ，８００℃以上形成ＴｉＢ２及ＴｉＢ，这些在ｃＢＮ表面外延生长的难熔化合物使Ｔｉ镀层与ｃＢＮ牢固结合并阻止了结合剂中的碱性组分对ｃＢＮ的侵蚀，镀ＴｉｃＢＮ晶体与结合剂则由低价的氧化钛为中介实现良好结合．
In order to eliminate any harmful chemical reaction during firing and improve the adhesion between the cBN grit and borosilicate glass bond, the interface reaction process, interface composition and structure between Ti-coated cBN and borosilicate glass bond at 600～1200℃ were studied by DAT, XRD, SEM and EPMA. The composition, structure and properties of vitrified bond Ti-coated cBN tool during firing were discussed. Test result shows that interface reaction between Ti-coating and cBN occurs above 600℃ through reaction diffusion, TiB and TiB2 are formed above 800℃. These Ti-coating and epitaxial compound films grown on surface of cBN improve the adhesion between the cBN grit and the bond, eliminate harmful chemical reaction during firing.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1995年第3期351-355,共5页
Journal of Inorganic Materials
基金
国家8.5重点科技攻关项目
