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Research of multilayers in EUV, soft X-ray and X-ray 被引量:7

Research of multilayers in EUV, soft X-ray and X-ray
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摘要 To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm, Mo/Si multilayers of 100 nm thickness deposited on both sides of silicon nitride were fabricated by using DC magnetron sputtering. Initial evaluation of their reflectivity and transmission showed that reflectivity and transmission were above 10% and 25%. The broadband analyzers have been designed, fabricated and characterized for 13~20 nm polarization measurements. The measured results are in good agreement with the design. The supermirrors with different angular intervals at 0.154 nm have been designed, fabricated and characterized. To develop beam splitters for soft X-ray laser Michelson interferometer at 13,9 nm, Mo/Si muhilayers of 100 nm thickness deposited on both sides of silicon nitride were fabricated by using DC magnetron sputtering. Initial evaluation of their reflectivity and transmission showed that reflectivity and transmission were above 10 % and 25 %. The broadband analyzers have been designed, fabricated and characterized for 13-20 nm polarization measurements. The measured results are in good agreement with the design. The supermirrors with different angular intervals at 0. 154 nm have been designed, fabricated and characterized.
出处 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期512-518,共7页 Optics and Precision Engineering
基金 Nationalnaturalsciencefoundationofchina(No.60378021,No.10435050)
关键词 EUV X射线 多层性 激光 宽带 光纤 multilayer analyzer broadband supermirror
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