摘要
由于管腔空间限制,物理气相沉积领域中管内壁沉积薄膜的均匀性和质量有待研究和改善。采用高功率脉冲磁控溅射技术(HiPIMS)在直径40 mm、长度120 mm的20#碳钢管内表面进行Cr薄膜沉积,并探究管内不同位置沉积Cr薄膜的结构和力学性能。采用SEM分析薄膜的截面形貌和厚度变化,采用AFM分析薄膜的表面形貌和表面粗糙度变化,采用XRD分析薄膜的晶相结构和晶粒尺寸,采用球-盘式旋转摩擦磨损试验机对薄膜的耐摩擦磨损性能进行测试。结果表明,随着管内深度的增加,距管口距离为15 mm(位置1)、45 mm(位置2)、75 mm(位置3)和105 mm(位置4)位置的膜层厚度分别为1690 nm、827 nm、210 nm和0 nm。从位置1到位置3,所沉积的Cr薄膜表面粗糙度由12.6 nm下降到4.8 nm,晶粒尺寸由15 nm增加到38 nm,摩擦因数由0.68上升到0.89。
Due to the limitation of lumen space,the uniformity and quality of films deposited on inner surface of tube by physical vapor deposition need to be studied and improved.Cr films are deposited by high power impulse magnetron sputtering on the inner surface of 20#carbon steel tube with diameter of 40 mm and length of 120 mm.And the microstructure and mechanical properties of Cr films deposited at different positions in the tube are studied.The cross-sectional morphology and thickness changes of Cr films are analyzed by SEM.The crystalline phase and the grain size of Cr films are analyzed by XRD.The friction factors of Cr films are evaluated on ball-on-disc wear apparatus.The results show that,with the increase of the depth in the tube,the film thickness with the distance of 15 mm(Position 1),45 mm(Position 2),75 mm(Position 3)and 105 mm(Position 4)from the tube orifice is 1690 nm,827 nm,210 nm and 0 nm respectively.With the increase of the depth in the tube,from Position 1 to Position 3,the surface roughness of the Cr films decreases from 12.6 nm to 4.8 nm,the grain size of the Cr films increases from 15 nm to 38nm,and the friction factor of the Cr films increase from 0.68 to 0.89.
作者
吴厚朴
田修波
郑林林
巩春志
张辉
WU Houpu;TIAN Xiubo;ZHENG Linlin;GONG Chunzhi;ZHANG Hui(State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,Harbin 150001,China)
出处
《中国表面工程》
EI
CAS
CSCD
北大核心
2022年第5期210-216,共7页
China Surface Engineering
基金
国家自然科学基金资助项目(12075071,11875119)
关键词
高功率脉冲磁控溅射
管内壁
Cr薄膜
微观结构
力学性能
high power impulse magnetron sputtering
inner surface of tube
Cr film
microstructure
mechanical property
