A dual-route optical emission spectroscopy(D-OES)diagnostic is newly developed to monitor the optical emission from the X-point plasma region on the HL-2 A tokamak.This diagnostic is composed of an imaging system,a be...A dual-route optical emission spectroscopy(D-OES)diagnostic is newly developed to monitor the optical emission from the X-point plasma region on the HL-2 A tokamak.This diagnostic is composed of an imaging system,a beam-splitting system for dual-route measurements,fiber bundles,a spectrometer system,and a control and acquisition system.One route is used to obtain wide-spectral-range spectra,and the other route is used to acquire high-wavelengthresolution line shapes.The spectral resolution of the wide-range spectrometers is 0.8 nm with a coverage of 800 nm(@200-1000 nm).The spectral resolution of the high-resolution spectrometer is 0.01 nm with a coverage of 6 nm(@200-660 nm).The spatial resolution of each route of D-OES is about 4 cm with 11 channels.The temporal resolution is 16 ms at maximum in the single-channel mode.Wide-range spectra(containing Balmer series and a Fulcher band)and highly resolved Ha line shapes are obtained by D-OES in the hydrogen glow discharge in the lab.D-OES measurements are carried out in the high-density deuterium experiments of HL-2A.The electron density n_(e)and deuterium temperature T_(D) in the X-point multifaceted asymmetric radiation from the edge(MARFE)region are derived simultaneously by fitting the measured D_(a) shape.The density n_(e)is observed to increase from~8.7×10^(18)m^(-3)to~7.8×10^(19)m^(-3),and the temperature T_(D)drops from~14.4 eV to~2.3 eV after the onset of MARFE in the discharge#38260.展开更多
The rapid quantitative analysis of nitrogen in steel with optical emission spectrometry is described.The problems about the selection of spectral line for the determination of nitrogen,the analytical conditions of nit...The rapid quantitative analysis of nitrogen in steel with optical emission spectrometry is described.The problems about the selection of spectral line for the determination of nitrogen,the analytical conditions of nitrogen,the preparation of analytical sample,the effect of co-existing element and the calibration curve of nitrogen are discussed.The analytical range of nitrogen is 0.000 5%to 0.30%,the limit of detection is 0.000 374%,the analytical time is less than 2 min(including the preparation of sample and the exciting sample for two times).Nitrogen in steel is simultaneously determined with alloy elements and acid soluble/insoluble compounds of aluminium.展开更多
An improved analytical method to determine the content of 52 major, minor and trace elements in marine geological samples, using a HF-HCl-HNO_3 acid system with a high-pressure closed digestion method（HPCD）, is stud...An improved analytical method to determine the content of 52 major, minor and trace elements in marine geological samples, using a HF-HCl-HNO_3 acid system with a high-pressure closed digestion method（HPCD）, is studied by an inductively coupled plasma optical emission spectrometry（ICP-OES） and an inductively coupled plasma mass spectrometry（ICP-MS）. The operating parameters of the instruments are optimized, and the optimal analytical parameters are determined. The influences of optical spectrum and mass spectrum interferences, digestion methods and acid systems on the analytical results are investigated. The optimal spectral lines and isotopes are chosen, and internal standard element of rhodium is selected to compensate for matrix effects and analytical signals drifting. Compared with the methods of an electric heating plate digestion and a microwave digestion, a high-pressure closed digestion method is optimized with less acid, complete digestion,less damage for digestion process. The marine geological samples are dissolved completely by a HF-HCl-HNO_3 system, the relative error（RE） for the analytical results are all less than 6.0%. The method detection limits are 2–40μg/g by the ICP-OES, and 6–80 ng/g by ICP-MS. The methods are used to determine the marine sediment reference materials（GBW07309, GBW07311, GBW07313）, rock reference materials（GBW07103, GBW07104,GBW07105）, and cobalt-rich crust reference materials（GBW07337, GBW07338, GBW07339）, the obtained analytical results are in agreement with the certified values, and both of the relative standard deviation（RSD） and the relative error（RE） are less than 6.0%. The analytical method meets the requirements for determining 52 elements contents of bulk marine geological samples.展开更多
Optical emission spectroscopy was used to study a gas mixture glow discharge of CO2 and N2 at a total pressure of 1.2 Torr, a power of 100 W and a flow of 16.5 L/min. The emission bands were measured in the wavelength...Optical emission spectroscopy was used to study a gas mixture glow discharge of CO2 and N2 at a total pressure of 1.2 Torr, a power of 100 W and a flow of 16.5 L/min. The emission bands were measured in the wavelength range of 200 nm to 900 nm. The principal species observed were O2^＋ （A^2П→ X^2П）, CO^＋ （A^2П→X^2∑）, N2^＋ （B^2∑u＋ → X^2∑g^＋）, CO2^＋ （A^2∏ → X^2∏）, N2（C^3∏u → B^3∏g）, O2（b^1∑g^＋→ X^3∑g^-）, and CO （a^r3∑→a^3∏）. The behavior of the band intensities as a function of the N2 percentage is consistent with recent Monte Carlo simulations. The electron temperature and ion density were determined by a double Langmuir probe. The electron temperature was found in the range of 1.55 eV to 2.93 eV, and the electron concentration in the order of 10^10 cm^-3. The electron temperature and ion density at pure N2 and pure CO2 agree with previous measurements.展开更多
As advanced linear plasma sources, cascaded arc plasma devices have been used to generate steady plasma with high electron density, high particle flux and low electron temperature. To measure electron density and elec...As advanced linear plasma sources, cascaded arc plasma devices have been used to generate steady plasma with high electron density, high particle flux and low electron temperature. To measure electron density and electron temperature of the plasma device accurately, a laser Thomson scattering（LTS） system, which is generally recognized as the most precise plasma diagnostic method, has been established in our lab in Dalian University of Technology. The electron density has been measured successfully in the region of 4.5？×10^19m^-3 to7.1？×10^20m^-3 and electron temperature in the region of 0.18 eV to 0.58 eV. For comparison,an optical emission spectroscopy（OES） system was established as well. The results showed that the electron excitation temperature（configuration temperature） measured by OES is significantly higher than the electron temperature（kinetic electron temperature） measured by LTS by up to 40% in the given discharge conditions. The results indicate that the cascaded arc plasma is recombining plasma and it is not in local thermodynamic equilibrium（LTE）. This leads to significant error using OES when characterizing the electron temperature in a non-LTE plasma.展开更多
Non-thermal C/H/Ar plasmas are widely applied to carbonaceous material production and processing.In this work,plasma parameters and gaseous species of the atmospheric non-thermal C/H/Ar plasmas produced by an atmosphe...Non-thermal C/H/Ar plasmas are widely applied to carbonaceous material production and processing.In this work,plasma parameters and gaseous species of the atmospheric non-thermal C/H/Ar plasmas produced by an atmospheric-pressure DC arc discharge generator in CH_4/Ar were investigated.The voltage-current characteristics were measured for different CH_4/Ar ratios.Optical emission spectroscopy was employed to analyze the electron excitation temperature,gas temperature and electron density under various discharge conditions.The hydrocarbon molecules produced in the CH4/Ar plasmas were detected with photoionization mass spectrometry.The optical spectral results demonstrated that the electron excitation temperature was 0.4-1 eV,the gas temperature was 2800-4200 K and the electron density was in the range of（5-20）×10^15 cm^-3.The mass spectrum indicated that a variety of unsaturated hydrocarbons（C2H4,C3H6,C6H6,etc.） and several highly unsaturated hydrocarbons（C4H2,C5H6,etc.） were produced in the non-thermal arc plasmas.展开更多
Effects of discharge mode, voltage applied, size of the nozzle discharge electrode and flow rate of water on the generation of hydroxyl radical were investigated in air discharge with atomized water, by using optical ...Effects of discharge mode, voltage applied, size of the nozzle discharge electrode and flow rate of water on the generation of hydroxyl radical were investigated in air discharge with atomized water, by using optical emission spectroscopy （OES）. Water was injected into the discharge region through the discharge nozzle electrode, and a large amount of fine water drops, formed and distributed in the discharge region, corona discharge was more effective to generate were observed. It was found that negative DC the hydroxyl radicals in comparison to positive DC corona discharge or negative pulsed discharge. A larger outer diameter of the nozzle electrode or a stronger electric field is beneficial for hydroxyl-radical generation. Moreover, there is a critical value in the flow rate of atomized water against the discharge voltage. Below this critical value, hydroxyl-radical generation increases with the increase in flow rate of the water, while above this value, it decreases. In addition, it is observed that OES from the discharge is mainly in the ultraviolet domain. The results are helpful in the study of the mechanism and application of plasma in pollution-control in either air or water.展开更多
The spectral emission and plasma parameters of SnO2 plasmas have been investigated. A planar ceramic SnO2 target was irradiated by a CO2 laser with a full width at half maximmn of 80 ns. The temporal behavior of the s...The spectral emission and plasma parameters of SnO2 plasmas have been investigated. A planar ceramic SnO2 target was irradiated by a CO2 laser with a full width at half maximmn of 80 ns. The temporal behavior of the specific emission lines from the SnO2 plasma was characterized. The intensities of Sn I and Sn Ⅱ lines first increased, and then decreased with the delay time. The results also showed a faster decay of Sn I atoms than that of Sn II ionic species. The temporal evolutions of the SnO2 plasma parameters （electron temperature and density） were deduced. The measured temperature and density of SnO2 plasma are 4.38 eV to 0.5 eV and 11.38×1017 cm 3 to 1.1×1017^ cm-3, for delay times between 0.1 μs and 2.2 #s. We also investigated the effect of the laser pulse energy on Sn02 plasma.展开更多
Optical emission spectroscopy in nitrogen glow discharge plasma is simulated, and the collision excitations and characteristic emissions of the species （N2, N2^＋, N^＋, N） are investigated by a Monte Carlo model fo...Optical emission spectroscopy in nitrogen glow discharge plasma is simulated, and the collision excitations and characteristic emissions of the species （N2, N2^＋, N^＋, N） are investigated by a Monte Carlo model for nitrogen molecular gas discharge. The excitation rates of the main excited states are calculated and the corresponding relation and relative magnitude between the distribution of excitation rate of a certain excited state and the distributions of the emission rates of various lines originating from this excited level are also explored. The simulated results are compared with the experimental measurements in two typical discharge conditions. The luminescence mechanism of the line N2^＋： 391.4 nm is explained based on the microscopic plasma processes. The cathode glow in N2 discharge is found to be mainly caused by N^＋ impact excitation and the intensity of cathode glow decreases with the voltage. The corresponding relation between the emission rate or intensity of the 391.4 nm line and the production rate and the density of N2^＋ is also examined.展开更多
A Maxwellian electron energy distribution function （EEDF） is often assumed when using the optical emission line-ratio method to determine the electron temperature in low- temperature plasmas. However, in many cases,...A Maxwellian electron energy distribution function （EEDF） is often assumed when using the optical emission line-ratio method to determine the electron temperature in low- temperature plasmas. However, in many cases, non-Maxwellian EEDFs can be formed due to the non-local electron heating or the inelastic-collisional energy loss processes. In this work, with a collisional-radiative model, we propose an approach to obtain the non-Maxwellian EEDF with a ＇two-temperature structure＇ from the emission line-ratios of Paschen 2p levels of argon and kryp- ton atoms. For applications of this approach in reactive gas （CF4, O2, etc） discharges that contain argon and krypton, recommendations of some specific emission line-ratios are provided, according to their sensitivities to the EEDF variation. The kinetic processes of the relevant excited atoms are also discussed in detail.展开更多
The capacitively coupled radio frequency（CCRF）plasma has been widely used in various fields.In some cases,it requires us to estimate the range of key plasma parameters simpler and quicker in order to understand the ...The capacitively coupled radio frequency（CCRF）plasma has been widely used in various fields.In some cases,it requires us to estimate the range of key plasma parameters simpler and quicker in order to understand the behavior in plasma.In this paper,a glass vacuum chamber and a pair of plate electrodes were designed and fabricated,using 13.56 MHz radio frequency（RF）discharge technology to ionize the working gas of Ar.This discharge was mathematically described with equivalent circuit model.The discharge voltage and current of the plasma were measured atdifferent pressures and different powers.Based on the capacitively coupled homogeneous discharge model,the equivalent circuit and the analytical formula were established.The plasma density and temperature were calculated by using the equivalent impedance principle and energy balance equation.The experimental results show that when RF discharge power is 50–300 W and pressure is 25–250 Pa,the average electron temperature is about 1.7–2.1 e V and the average electron density is about 0.5？×10^17–3.6？×10^17m^-3.Agreement was found when the results were compared to those given by optical emission spectroscopy and COMSOL simulation.展开更多
Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameter...Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameters and process parameters.In this study,the plasma state with each process parameters were analyzed through the optical emission spectroscopy(OES)plasma diagnostic sensor by both chemical and physical approaches.Electron temperature and electron density were additionally acquired using the corona model with OES data that provides chemical species information,and the etch profile was evaluated through scanning electron microscope measurement data.The results include changes in profile with gas ratio,bias power,and pressure.We figure out that factors like ion energy and ion angular distribution as well as chemical reaction affect the anisotropic profile.展开更多
Atmospheric pressure micro-discharges in helium gas with a mixture of 0.5%water vapor between two pin electrodes are generated with nanosecond overvoltage pulses.The temporal and spatial characteristics of the dischar...Atmospheric pressure micro-discharges in helium gas with a mixture of 0.5%water vapor between two pin electrodes are generated with nanosecond overvoltage pulses.The temporal and spatial characteristics of the discharges are investigated by means of time-resolved imaging and optical emission spectroscopy with respect to the discharge morphology,gas temperature,electron density,and excited species.The evolution of micro-discharges is captured by intensified CCD camera and electrical properties.The gas temperature is diagnosed by a two-temperature fit to the ro-vibrational OH(A^(2)Σ^(+)–X^П(2),0–0)emission band and is found to remain low at 425 K during the discharge pulses.The profile of electron density performed by the Stark broadening of Ha 656.1-nm and He I 667.8-nm lines is uniform across the discharge gap at the initial of discharge and reaches as high as 10^(23)m^(-3).The excited species of He,OH,and H show different spatio-temporal behaviors from each other by the measurement of their emission intensities,which are discussed qualitatively in regard of their plasma kinetics.展开更多
In the present study nano-tungsten carbide particles were generated in a wire explosion process.The plasma generated during the wire explosion process was analyzed using optical emission spectroscopy（OES）.The impact...In the present study nano-tungsten carbide particles were generated in a wire explosion process.The plasma generated during the wire explosion process was analyzed using optical emission spectroscopy（OES）.The impact of ambient pressure on the plasma temperature,electron density and plasma lifetime was studied.Lifetime variations of the plasma produced under different experimental conditions were analyzed.The produced nanoparticles were characterized through wide angle X-ray diffraction（WAXD） and transmission electron microscopy（TEM） studies. Particles produced with a negative DC charging voltage had a larger mean size when compared to a positive charging voltage.Polarity dependence on the plasma duration was observed where plasma was sustained for a longer duration with a negative DC charging voltage.展开更多
A series of hydrogenated silicon thin films with varying silane concentrations have been deposited by using very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） method. The deposition process an...A series of hydrogenated silicon thin films with varying silane concentrations have been deposited by using very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） method. The deposition process and the silicon thin films are studied by using optical emission spectroscopy （OES） and Fourier transfer infrared （FTIR） spectroscopy, respectively. The results show that when the silane concentration changes from 10% to 1%, the peak frequency of the Si-H stretching mode shifts from 2000 cm-1 to 2100 cm-1, while the peak frequency of the Si-H wagging-rocking mode shifts from 650 cm-1 to 620 cm-1. At the same time the SiH^＊/Ha intensity ratio in the plasma decreases gradually. The evolution of the infrared spectra and the optical emission spectra demonstrates a morphological phase transition from amorphous silicon （a-Si：H） to microcrystalline silicon （μc-Si：H）. The structural evolution and the p-c-SiH formation have been analyzed based on the variation of Ha and SiH^＊ intensities in the plasma. The role of oxygen impurity during the plasma process and in the silicon films is also discussed in this study.展开更多
The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma （ICP） were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-...The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma （ICP） were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-frequency （RF） power and different positions in the discharge chamber on the line intensities were investigated in this study. It was found that the intensity of Ar atom line increased firstly and then saturated with the increase of the pressure. The line intensity of Ar^＋, on the other hand, reached a maximum value and then decreased along with the pressure. The intensity of the line in an RF discharge also demonstrated a jumping mode and a hysteresis phenomenon with the RF power. When the RF power increased to 400 W, the discharge jumped from the E-mode to the H-mode where the line intensity of Ar atom demonstrated a sudden increase, while the intensity of Ar^＋ ion only changed slightly. If the RF power decreased from a high value, e.g., 1000 W, the discharge would jump from the H-mode back to the E-mode at a power of 300 W. At this time the intensities of Ar and Ar^＋ lines would also decrease sharply. It was also noticed in this paper that the intensity of the ion line depended on the detective location in the chamber, namely at the bottom of the chamber the line was more intense than that in the middle of the chamber, but less intense than at the top, which is considered to be related to the capacitance coupling ability of the ICP plasma in different discharge areas.展开更多
This paper reports that the optical emission spectroscopy （OES） is used to monitor the plasma during the deposition process of hydrogenated microcrystalline silicon films in a very high frequency plasma enhanced che...This paper reports that the optical emission spectroscopy （OES） is used to monitor the plasma during the deposition process of hydrogenated microcrystalline silicon films in a very high frequency plasma enhanced chemical vapour deposition system. The OES intensities （Sill^＊, H^＊ and H^＊β） are investigated by varying the deposition parameters. The result shows that the discharge power, silane concentrations and substrate temperature affect the OES intensities. When the discharge power at silane concentration of 4% increases, the OES intensities increase first and then are constant, the intensities increase with the discharge power monotonously at silane concentration of 6%. The SiH^＊ intensity increases with silane concentration, while the intensities of H^＊α and H^＊β increase first and then decrease. When the substrate temperature increases, the SiH^＊ intensity decreases and the intensities of H^＊α and H^＊β are constant. The correlation between the intensity ratio of IH^＊α/ISiH^＊ and the crystalline volume fraction （Xc） of films is confirmed.展开更多
In this paper, volume barrier discharge with different gap distances is added on the discharge border of high-voltage electrode of annular surface barrier discharge for generating volume added surface barrier dischar...In this paper, volume barrier discharge with different gap distances is added on the discharge border of high-voltage electrode of annular surface barrier discharge for generating volume added surface barrier discharge （V-SBD） excited by bipolar nanosecond high-voltage pulse power in atmospheric air. The excited V-SBDs consist of surface barrier discharge （d = 0 mm） and volume added surface barrier discharges （d = 2 mm and 3 mm）. The optical emission spectra are recorded for calculating emission intensities of N2 （C3 ∏u → B3∏g） and N2＋ （B2 ∑u＋ → X2 ∑g＋）, and simulating rotational and vibrational temperatures. The influences of gap distance of V-SBD on emission intensity and plasma temperature are also investigated and analyzed. The results show that d = 0 mm structure can excite the largest emission intensity of N2 （C3 ∏u → B3 ∏g）, while the existence of volume barrier discharge can delay the occurrence of the peak value of the emission intensity ratio of N2 ＋ （B2 ∑u＋ → X2 ∑＋g）/N2 （C3 ∏u → B3 ∏g） during the rising period of the applied voltage pulse and weaken it during the end period. The increasing factor of emission intensity is effected by the pulse repetition rate. The d = 3 mm structure has the highest threshold voltage while it can maintain more emission intensity of N2 （C3 ∏u→ B3∏g） than that of d = 2 mm structure. The structure of d = 2 mm can maintain more increasing factor than that of the d = 3 mm structure with varying pulse repetition rate. Besides, the rotational temperatures of three V-SBD structures are slightly affected when the gap distance and pulse repetition rate vary. The vibrational temperatures have decaying tendencies of all three structures with the increasing pulse repetition rate.展开更多
In this paper,volume coupled surface barrier discharge（V-SBD） with three structures possessing different volumes is excited by sine AC power in atmospheric air.Discharge images,waveforms of applied voltage and disch...In this paper,volume coupled surface barrier discharge（V-SBD） with three structures possessing different volumes is excited by sine AC power in atmospheric air.Discharge images,waveforms of applied voltage and discharge current,and optical emission spectra simulating rotational and vibrational temperatures are recorded and analyzed.The effects of applied voltage on emission intensities of N2（C^3Πu→ B^3Πg） and N2^＋（B^2∑u^＋ → X^2Eg^＋）,and rotational and vibrational temperatures are investigated.The results show that as applied voltage rises,emission intensities and rotational temperatures increase while vibrational temperatures decrease.In addition it is found that,as applied voltage varies,the rotational temperature of surface discharge changes faster than that of volume discharge.展开更多
The oxidation of aluminium was studied using optical emission spectroscopy （OES） during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-...The oxidation of aluminium was studied using optical emission spectroscopy （OES） during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-O with that of Al follows the exact trend as of that obtained from the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. In this paper the inherent capacity of emission spectroscopy in evaluating the growth processes under plasma induced reactions is presented.展开更多
基金supported by the National MCF Energy R&D Program of China(Nos.2018YFE0301102,2022YFE03100004 and 2018YFE 0303102)National Natural Science Foundation of China(Nos.12375210 and 12305238)the Sichuan Natural Science Foundation(Nos.2022NSFSC1791,2022JDRC0014 and 2022TFQCCXTD)。
文摘A dual-route optical emission spectroscopy(D-OES)diagnostic is newly developed to monitor the optical emission from the X-point plasma region on the HL-2 A tokamak.This diagnostic is composed of an imaging system,a beam-splitting system for dual-route measurements,fiber bundles,a spectrometer system,and a control and acquisition system.One route is used to obtain wide-spectral-range spectra,and the other route is used to acquire high-wavelengthresolution line shapes.The spectral resolution of the wide-range spectrometers is 0.8 nm with a coverage of 800 nm(@200-1000 nm).The spectral resolution of the high-resolution spectrometer is 0.01 nm with a coverage of 6 nm(@200-660 nm).The spatial resolution of each route of D-OES is about 4 cm with 11 channels.The temporal resolution is 16 ms at maximum in the single-channel mode.Wide-range spectra(containing Balmer series and a Fulcher band)and highly resolved Ha line shapes are obtained by D-OES in the hydrogen glow discharge in the lab.D-OES measurements are carried out in the high-density deuterium experiments of HL-2A.The electron density n_(e)and deuterium temperature T_(D) in the X-point multifaceted asymmetric radiation from the edge(MARFE)region are derived simultaneously by fitting the measured D_(a) shape.The density n_(e)is observed to increase from~8.7×10^(18)m^(-3)to~7.8×10^(19)m^(-3),and the temperature T_(D)drops from~14.4 eV to~2.3 eV after the onset of MARFE in the discharge#38260.
基金supported by Standard Substance Research Group,Central Iron and Steel Research Institute
文摘The rapid quantitative analysis of nitrogen in steel with optical emission spectrometry is described.The problems about the selection of spectral line for the determination of nitrogen,the analytical conditions of nitrogen,the preparation of analytical sample,the effect of co-existing element and the calibration curve of nitrogen are discussed.The analytical range of nitrogen is 0.000 5%to 0.30%,the limit of detection is 0.000 374%,the analytical time is less than 2 min(including the preparation of sample and the exciting sample for two times).Nitrogen in steel is simultaneously determined with alloy elements and acid soluble/insoluble compounds of aluminium.
基金The China Ocean Mineral Resources Research and Development Association Research Program of the State Oceanic Administration of China under contract No.DY125-13-R-07the National Natural Science Foundation of China under contract Nos 41322036 and 41230960+1 种基金the Shandong Provincial Natural Science Foundation of China under contract No.ZR2014DP009the Special Basic Research Funds for Central Public Research Institutes for The First Institute of Oceanography,State Oceanic Administration of China under contract Nos GY0213G06 and GY02-2012G35
文摘An improved analytical method to determine the content of 52 major, minor and trace elements in marine geological samples, using a HF-HCl-HNO_3 acid system with a high-pressure closed digestion method（HPCD）, is studied by an inductively coupled plasma optical emission spectrometry（ICP-OES） and an inductively coupled plasma mass spectrometry（ICP-MS）. The operating parameters of the instruments are optimized, and the optimal analytical parameters are determined. The influences of optical spectrum and mass spectrum interferences, digestion methods and acid systems on the analytical results are investigated. The optimal spectral lines and isotopes are chosen, and internal standard element of rhodium is selected to compensate for matrix effects and analytical signals drifting. Compared with the methods of an electric heating plate digestion and a microwave digestion, a high-pressure closed digestion method is optimized with less acid, complete digestion,less damage for digestion process. The marine geological samples are dissolved completely by a HF-HCl-HNO_3 system, the relative error（RE） for the analytical results are all less than 6.0%. The method detection limits are 2–40μg/g by the ICP-OES, and 6–80 ng/g by ICP-MS. The methods are used to determine the marine sediment reference materials（GBW07309, GBW07311, GBW07313）, rock reference materials（GBW07103, GBW07104,GBW07105）, and cobalt-rich crust reference materials（GBW07337, GBW07338, GBW07339）, the obtained analytical results are in agreement with the certified values, and both of the relative standard deviation（RSD） and the relative error（RE） are less than 6.0%. The analytical method meets the requirements for determining 52 elements contents of bulk marine geological samples.
基金supported by UAEM 2260/06, UAEM 2362/2006U, PROMEP FE018/2003 of Mexico
文摘Optical emission spectroscopy was used to study a gas mixture glow discharge of CO2 and N2 at a total pressure of 1.2 Torr, a power of 100 W and a flow of 16.5 L/min. The emission bands were measured in the wavelength range of 200 nm to 900 nm. The principal species observed were O2^＋ （A^2П→ X^2П）, CO^＋ （A^2П→X^2∑）, N2^＋ （B^2∑u＋ → X^2∑g^＋）, CO2^＋ （A^2∏ → X^2∏）, N2（C^3∏u → B^3∏g）, O2（b^1∑g^＋→ X^3∑g^-）, and CO （a^r3∑→a^3∏）. The behavior of the band intensities as a function of the N2 percentage is consistent with recent Monte Carlo simulations. The electron temperature and ion density were determined by a double Langmuir probe. The electron temperature was found in the range of 1.55 eV to 2.93 eV, and the electron concentration in the order of 10^10 cm^-3. The electron temperature and ion density at pure N2 and pure CO2 agree with previous measurements.
基金supported by the National Magnetic Confinement Fusion Science Program of China(No.2013GB109005)the Fundamental Research Funds for the Central Universities(Nos.DUT15RC(3)072,DUT15TD44,DUT16TD13)
文摘As advanced linear plasma sources, cascaded arc plasma devices have been used to generate steady plasma with high electron density, high particle flux and low electron temperature. To measure electron density and electron temperature of the plasma device accurately, a laser Thomson scattering（LTS） system, which is generally recognized as the most precise plasma diagnostic method, has been established in our lab in Dalian University of Technology. The electron density has been measured successfully in the region of 4.5？×10^19m^-3 to7.1？×10^20m^-3 and electron temperature in the region of 0.18 eV to 0.58 eV. For comparison,an optical emission spectroscopy（OES） system was established as well. The results showed that the electron excitation temperature（configuration temperature） measured by OES is significantly higher than the electron temperature（kinetic electron temperature） measured by LTS by up to 40% in the given discharge conditions. The results indicate that the cascaded arc plasma is recombining plasma and it is not in local thermodynamic equilibrium（LTE）. This leads to significant error using OES when characterizing the electron temperature in a non-LTE plasma.
基金supported by National Natural Science Foundation of China(Nos.11035005,11475174,50876101)USTC-NSRL Association Funding(No.KY2090130001)
文摘Non-thermal C/H/Ar plasmas are widely applied to carbonaceous material production and processing.In this work,plasma parameters and gaseous species of the atmospheric non-thermal C/H/Ar plasmas produced by an atmospheric-pressure DC arc discharge generator in CH_4/Ar were investigated.The voltage-current characteristics were measured for different CH_4/Ar ratios.Optical emission spectroscopy was employed to analyze the electron excitation temperature,gas temperature and electron density under various discharge conditions.The hydrocarbon molecules produced in the CH4/Ar plasmas were detected with photoionization mass spectrometry.The optical spectral results demonstrated that the electron excitation temperature was 0.4-1 eV,the gas temperature was 2800-4200 K and the electron density was in the range of（5-20）×10^15 cm^-3.The mass spectrum indicated that a variety of unsaturated hydrocarbons（C2H4,C3H6,C6H6,etc.） and several highly unsaturated hydrocarbons（C4H2,C5H6,etc.） were produced in the non-thermal arc plasmas.
基金supported by Science and Technology Commission of Shanghai Municipality of China(No.09ZR1421200)Shanghai Maritime University of China(No.2008462)
文摘Effects of discharge mode, voltage applied, size of the nozzle discharge electrode and flow rate of water on the generation of hydroxyl radical were investigated in air discharge with atomized water, by using optical emission spectroscopy （OES）. Water was injected into the discharge region through the discharge nozzle electrode, and a large amount of fine water drops, formed and distributed in the discharge region, corona discharge was more effective to generate were observed. It was found that negative DC the hydroxyl radicals in comparison to positive DC corona discharge or negative pulsed discharge. A larger outer diameter of the nozzle electrode or a stronger electric field is beneficial for hydroxyl-radical generation. Moreover, there is a critical value in the flow rate of atomized water against the discharge voltage. Below this critical value, hydroxyl-radical generation increases with the increase in flow rate of the water, while above this value, it decreases. In addition, it is observed that OES from the discharge is mainly in the ultraviolet domain. The results are helpful in the study of the mechanism and application of plasma in pollution-control in either air or water.
基金supported by National Natural Science Foundation of China(No.11304235)the Director Fund of WNLO
文摘The spectral emission and plasma parameters of SnO2 plasmas have been investigated. A planar ceramic SnO2 target was irradiated by a CO2 laser with a full width at half maximmn of 80 ns. The temporal behavior of the specific emission lines from the SnO2 plasma was characterized. The intensities of Sn I and Sn Ⅱ lines first increased, and then decreased with the delay time. The results also showed a faster decay of Sn I atoms than that of Sn II ionic species. The temporal evolutions of the SnO2 plasma parameters （electron temperature and density） were deduced. The measured temperature and density of SnO2 plasma are 4.38 eV to 0.5 eV and 11.38×1017 cm 3 to 1.1×1017^ cm-3, for delay times between 0.1 μs and 2.2 #s. We also investigated the effect of the laser pulse energy on Sn02 plasma.
基金Natural Science Foundation of Hebei Province of China(Nos.A2006000123,F2006000183)
文摘Optical emission spectroscopy in nitrogen glow discharge plasma is simulated, and the collision excitations and characteristic emissions of the species （N2, N2^＋, N^＋, N） are investigated by a Monte Carlo model for nitrogen molecular gas discharge. The excitation rates of the main excited states are calculated and the corresponding relation and relative magnitude between the distribution of excitation rate of a certain excited state and the distributions of the emission rates of various lines originating from this excited level are also explored. The simulated results are compared with the experimental measurements in two typical discharge conditions. The luminescence mechanism of the line N2^＋： 391.4 nm is explained based on the microscopic plasma processes. The cathode glow in N2 discharge is found to be mainly caused by N^＋ impact excitation and the intensity of cathode glow decreases with the voltage. The corresponding relation between the emission rate or intensity of the 391.4 nm line and the production rate and the density of N2^＋ is also examined.
基金supported by National Natural Science Foundation of China （Nos. 11075093 and 10935006） and the China Postdoctoral Science Foundation （No. 20100480327）
文摘A Maxwellian electron energy distribution function （EEDF） is often assumed when using the optical emission line-ratio method to determine the electron temperature in low- temperature plasmas. However, in many cases, non-Maxwellian EEDFs can be formed due to the non-local electron heating or the inelastic-collisional energy loss processes. In this work, with a collisional-radiative model, we propose an approach to obtain the non-Maxwellian EEDF with a ＇two-temperature structure＇ from the emission line-ratios of Paschen 2p levels of argon and kryp- ton atoms. For applications of this approach in reactive gas （CF4, O2, etc） discharges that contain argon and krypton, recommendations of some specific emission line-ratios are provided, according to their sensitivities to the EEDF variation. The kinetic processes of the relevant excited atoms are also discussed in detail.
基金supported by National Natural Science Foundation of China(Grant No.61378037)the Fundamental Research Funds for the Central Universities(Nos.2013B33614,2017B15214)+1 种基金the Research Funds of Innovation and Entrepreneurship Education Reform for Chinese Universities(No.16CCJG01Z004)the Changzhou Science and Technology Program(No.CJ20160027)
文摘The capacitively coupled radio frequency（CCRF）plasma has been widely used in various fields.In some cases,it requires us to estimate the range of key plasma parameters simpler and quicker in order to understand the behavior in plasma.In this paper,a glass vacuum chamber and a pair of plate electrodes were designed and fabricated,using 13.56 MHz radio frequency（RF）discharge technology to ionize the working gas of Ar.This discharge was mathematically described with equivalent circuit model.The discharge voltage and current of the plasma were measured atdifferent pressures and different powers.Based on the capacitively coupled homogeneous discharge model,the equivalent circuit and the analytical formula were established.The plasma density and temperature were calculated by using the equivalent impedance principle and energy balance equation.The experimental results show that when RF discharge power is 50–300 W and pressure is 25–250 Pa,the average electron temperature is about 1.7–2.1 e V and the average electron density is about 0.5？×10^17–3.6？×10^17m^-3.Agreement was found when the results were compared to those given by optical emission spectroscopy and COMSOL simulation.
基金supported by the Koran Ministry of Trade,Industry&Energy(MOTIE:GID:20006499)via KSRC(Korea Semiconductor Research Consortium)support program。
文摘Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameters and process parameters.In this study,the plasma state with each process parameters were analyzed through the optical emission spectroscopy(OES)plasma diagnostic sensor by both chemical and physical approaches.Electron temperature and electron density were additionally acquired using the corona model with OES data that provides chemical species information,and the etch profile was evaluated through scanning electron microscope measurement data.The results include changes in profile with gas ratio,bias power,and pressure.We figure out that factors like ion energy and ion angular distribution as well as chemical reaction affect the anisotropic profile.
基金supported by the National Natural Science Foundation of China(Grant No.51806186)the Natural Science Foundation of the Jiangsu Higher Education Institutions of China(Grant No.20KJB140025)+1 种基金the Natural Science Foundation of Jiangsu Province,China(Grant No.BK20181050)the Scientific Research Project for the Introduction Talent of Yancheng Institute of Technology(Grant No.XJR2020)。
文摘Atmospheric pressure micro-discharges in helium gas with a mixture of 0.5%water vapor between two pin electrodes are generated with nanosecond overvoltage pulses.The temporal and spatial characteristics of the discharges are investigated by means of time-resolved imaging and optical emission spectroscopy with respect to the discharge morphology,gas temperature,electron density,and excited species.The evolution of micro-discharges is captured by intensified CCD camera and electrical properties.The gas temperature is diagnosed by a two-temperature fit to the ro-vibrational OH(A^(2)Σ^(+)–X^П(2),0–0)emission band and is found to remain low at 425 K during the discharge pulses.The profile of electron density performed by the Stark broadening of Ha 656.1-nm and He I 667.8-nm lines is uniform across the discharge gap at the initial of discharge and reaches as high as 10^(23)m^(-3).The excited species of He,OH,and H show different spatio-temporal behaviors from each other by the measurement of their emission intensities,which are discussed qualitatively in regard of their plasma kinetics.
文摘In the present study nano-tungsten carbide particles were generated in a wire explosion process.The plasma generated during the wire explosion process was analyzed using optical emission spectroscopy（OES）.The impact of ambient pressure on the plasma temperature,electron density and plasma lifetime was studied.Lifetime variations of the plasma produced under different experimental conditions were analyzed.The produced nanoparticles were characterized through wide angle X-ray diffraction（WAXD） and transmission electron microscopy（TEM） studies. Particles produced with a negative DC charging voltage had a larger mean size when compared to a positive charging voltage.Polarity dependence on the plasma duration was observed where plasma was sustained for a longer duration with a negative DC charging voltage.
基金Project supported by the National High Technology Research and Development Program of China (Grant No. 2009AA050602)the International Cooperation Project between China-Greece Government (Grant No. 2009DFA62580)the National Basic Research Program of China (Grant Nos. 2011CBA00705, 2011CBA00706, and 2011CBA00707)
文摘A series of hydrogenated silicon thin films with varying silane concentrations have been deposited by using very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） method. The deposition process and the silicon thin films are studied by using optical emission spectroscopy （OES） and Fourier transfer infrared （FTIR） spectroscopy, respectively. The results show that when the silane concentration changes from 10% to 1%, the peak frequency of the Si-H stretching mode shifts from 2000 cm-1 to 2100 cm-1, while the peak frequency of the Si-H wagging-rocking mode shifts from 650 cm-1 to 620 cm-1. At the same time the SiH^＊/Ha intensity ratio in the plasma decreases gradually. The evolution of the infrared spectra and the optical emission spectra demonstrates a morphological phase transition from amorphous silicon （a-Si：H） to microcrystalline silicon （μc-Si：H）. The structural evolution and the p-c-SiH formation have been analyzed based on the variation of Ha and SiH^＊ intensities in the plasma. The role of oxygen impurity during the plasma process and in the silicon films is also discussed in this study.
基金supported by National Natural Science Foundation of China (Nos.50277003,10505005)
文摘The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma （ICP） were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-frequency （RF） power and different positions in the discharge chamber on the line intensities were investigated in this study. It was found that the intensity of Ar atom line increased firstly and then saturated with the increase of the pressure. The line intensity of Ar^＋, on the other hand, reached a maximum value and then decreased along with the pressure. The intensity of the line in an RF discharge also demonstrated a jumping mode and a hysteresis phenomenon with the RF power. When the RF power increased to 400 W, the discharge jumped from the E-mode to the H-mode where the line intensity of Ar atom demonstrated a sudden increase, while the intensity of Ar^＋ ion only changed slightly. If the RF power decreased from a high value, e.g., 1000 W, the discharge would jump from the H-mode back to the E-mode at a power of 300 W. At this time the intensities of Ar and Ar^＋ lines would also decrease sharply. It was also noticed in this paper that the intensity of the ion line depended on the detective location in the chamber, namely at the bottom of the chamber the line was more intense than that in the middle of the chamber, but less intense than at the top, which is considered to be related to the capacitance coupling ability of the ICP plasma in different discharge areas.
文摘This paper reports that the optical emission spectroscopy （OES） is used to monitor the plasma during the deposition process of hydrogenated microcrystalline silicon films in a very high frequency plasma enhanced chemical vapour deposition system. The OES intensities （Sill^＊, H^＊ and H^＊β） are investigated by varying the deposition parameters. The result shows that the discharge power, silane concentrations and substrate temperature affect the OES intensities. When the discharge power at silane concentration of 4% increases, the OES intensities increase first and then are constant, the intensities increase with the discharge power monotonously at silane concentration of 6%. The SiH^＊ intensity increases with silane concentration, while the intensities of H^＊α and H^＊β increase first and then decrease. When the substrate temperature increases, the SiH^＊ intensity decreases and the intensities of H^＊α and H^＊β are constant. The correlation between the intensity ratio of IH^＊α/ISiH^＊ and the crystalline volume fraction （Xc） of films is confirmed.
基金supported by National Key R&D Program of China (2016YFC0207200)National Natural Science Foundation of China (Nos. 51377014, 51407022 and 51677019)
文摘In this paper, volume barrier discharge with different gap distances is added on the discharge border of high-voltage electrode of annular surface barrier discharge for generating volume added surface barrier discharge （V-SBD） excited by bipolar nanosecond high-voltage pulse power in atmospheric air. The excited V-SBDs consist of surface barrier discharge （d = 0 mm） and volume added surface barrier discharges （d = 2 mm and 3 mm）. The optical emission spectra are recorded for calculating emission intensities of N2 （C3 ∏u → B3∏g） and N2＋ （B2 ∑u＋ → X2 ∑g＋）, and simulating rotational and vibrational temperatures. The influences of gap distance of V-SBD on emission intensity and plasma temperature are also investigated and analyzed. The results show that d = 0 mm structure can excite the largest emission intensity of N2 （C3 ∏u → B3 ∏g）, while the existence of volume barrier discharge can delay the occurrence of the peak value of the emission intensity ratio of N2 ＋ （B2 ∑u＋ → X2 ∑＋g）/N2 （C3 ∏u → B3 ∏g） during the rising period of the applied voltage pulse and weaken it during the end period. The increasing factor of emission intensity is effected by the pulse repetition rate. The d = 3 mm structure has the highest threshold voltage while it can maintain more emission intensity of N2 （C3 ∏u→ B3∏g） than that of d = 2 mm structure. The structure of d = 2 mm can maintain more increasing factor than that of the d = 3 mm structure with varying pulse repetition rate. Besides, the rotational temperatures of three V-SBD structures are slightly affected when the gap distance and pulse repetition rate vary. The vibrational temperatures have decaying tendencies of all three structures with the increasing pulse repetition rate.
基金supported by National Natural Science Foundation of China(Grant Nos.51377014,51407022 and 51677019)the National Key Research and Development program of China(No.2016YFC0207200)
文摘In this paper,volume coupled surface barrier discharge（V-SBD） with three structures possessing different volumes is excited by sine AC power in atmospheric air.Discharge images,waveforms of applied voltage and discharge current,and optical emission spectra simulating rotational and vibrational temperatures are recorded and analyzed.The effects of applied voltage on emission intensities of N2（C^3Πu→ B^3Πg） and N2^＋（B^2∑u^＋ → X^2Eg^＋）,and rotational and vibrational temperatures are investigated.The results show that as applied voltage rises,emission intensities and rotational temperatures increase while vibrational temperatures decrease.In addition it is found that,as applied voltage varies,the rotational temperature of surface discharge changes faster than that of volume discharge.
基金support rendered by BRNS (DAE, India) for the project
文摘The oxidation of aluminium was studied using optical emission spectroscopy （OES） during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-O with that of Al follows the exact trend as of that obtained from the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. In this paper the inherent capacity of emission spectroscopy in evaluating the growth processes under plasma induced reactions is presented.
