Two strain-state samples of GaN, labelled the strain-relief sample and the quality-improved sample, were grown by hydride vapour phase epitaxy （HVPE）, and then characterized by high-resolution X-ray diffraction, pho...Two strain-state samples of GaN, labelled the strain-relief sample and the quality-improved sample, were grown by hydride vapour phase epitaxy （HVPE）, and then characterized by high-resolution X-ray diffraction, photoluminescence and optical microscopy. Two strain states of GaN in HVPE, like 3D and 2[） growth modes in metal-organic chemical vapour deposition （MOCVD）, provide an effective way to solve the heteroepitaxial problems of both strain relief and quality improvement. The gradual variation metbod （GVM）, developed based on the two strain states, is characterized by growth parameters＇ gradual variation alternating between the strain-relief growth conditions and the quality-improved growth conditions. In GVM, the introduction of the strain-relief amplitude, which is defined by the range from the quality-improved growth conditions to the strain-relief growth conditions, makes the strain-relief control concise and effective. The 300-μm thick bright and crack-free GaN film grown on a two-inch sapphire proves the effectiveness of GVM.展开更多
The heteroepitaxy of semiconductor thin films is a cornerstone of semiconductor devices and is naturally preferred to grow on matched substrates from the view point of material epitaxy. However, the heteroepitaxy is a...The heteroepitaxy of semiconductor thin films is a cornerstone of semiconductor devices and is naturally preferred to grow on matched substrates from the view point of material epitaxy. However, the heteroepitaxy is always performed on mismatched substrates due to the limited choices of mature substrates, which constrains the quality of semiconductor thin films.展开更多
The present understanding of diamond heteroepitaxy by bias-enhanced chemical vapour deposition on technologically relevant substrate materials is briefly reviewed. First the early stages of diamond nucleation and the ...The present understanding of diamond heteroepitaxy by bias-enhanced chemical vapour deposition on technologically relevant substrate materials is briefly reviewed. First the early stages of diamond nucleation and the diamond film growth as well as influences of various deposition conditions are described. Then the results of microscopic investigations of the structure of interfaces and of grain boundaries are summarized.展开更多
The mechanism of chemical-vapor-deposited (CVD) diamond film growth has attracted increasing attention recent years, mainly due to the fact that further technological advancement (such as obtaining high-quality films,...The mechanism of chemical-vapor-deposited (CVD) diamond film growth has attracted increasing attention recent years, mainly due to the fact that further technological advancement (such as obtaining high-quality films, controlling film growth, and heteroepitaxial growth, etc.) requires a more detailed understanding of the fundamental phenomena responsible for diamond growth.展开更多
Diamond and cubic boron nitride films have already been applied practically be- cause of their excellent properties. The specific orientations of the films have spe- cial meaning on their application in optics and mic...Diamond and cubic boron nitride films have already been applied practically be- cause of their excellent properties. The specific orientations of the films have spe- cial meaning on their application in optics and microelectronics fields. In this paper, the relative electron density differences of the interface between the different crystal planes of silicon substrate and those of diamond and cubic boron films are calculated with the empirical electron theory in solids and molecules. Analyses on the calculation results show that in the range of the researched films, the smaller the relative electron density difference between the film and the substrate is, the stabler the film is in thermodynamics. Therefore, the electron density difference is the essential factor of determining the orientation of the texture and heteroepitaxy of the films. The deductions accord well with the experimental facts. The calcula- tion methods and the theory not only provide a new angle of view for the research of the growth mechanism of diamond film and cubic boron nitride film on the sili- con substrate, but also provide a possible direction for the prediction of the orien- tation of other films.展开更多
The phase-field crystal(PFC) model is employed to study the shape transition of strained islands in heteroepitaxy on vicinal substrates.The influences of both substrate vicinal angles β and the lattice mismatch ξ ar...The phase-field crystal(PFC) model is employed to study the shape transition of strained islands in heteroepitaxy on vicinal substrates.The influences of both substrate vicinal angles β and the lattice mismatch ξ are discussed.The increase of substrate vicinal angles is found to be capable of significantly changing the surface nanostructures of epitaxial films.The surface morphology of films undergoes a series of transitions that include Stranski-Krastonov(SK) islands,the couple growth of islands and the step flow as well as the formation of step bunching.In addition,the larger ξ indicates an increased strained island density after coarsening,and results in the incoherent growth of strained islands with the creation of misfit dislocations.Coarsening,coalescence and faceting of strained islands are also observed.Some facets in the shape transition of strained islands are found to be stable and can be determined by β and crystal symmetry of the film.展开更多
Steering the directional carrier migration across the interface is a central mission for efficient photocatalytic reactions.In this work,an atomic-shared heterointerface is constructed between the defect-rich ZnIn_(2)...Steering the directional carrier migration across the interface is a central mission for efficient photocatalytic reactions.In this work,an atomic-shared heterointerface is constructed between the defect-rich ZnIn_(2)S_(4)(HVs-ZIS)and CoIn_(2)S_(4)(CIS)via a defect-guided heteroepitaxial growth strategy.The strong interface coupling induces adequate carriers exchanging passageway between HVs-ZIS and CIS,enhancing the internal electric field(IEF)in the ZnIn_(2)S_(4)/CoIn_(2)S_(4)(HVs-ZIS/CIS)heterostructure.The defect structure in HVs-ZIS induces an additional defect level,improving the separation efficiency of photocarriers.Moreover,promoted by the IEF and intimate heterointerface,photogenerated electrons trapped by the defect level can migrate to the valence band of CIS,contributing to massive photogenerated electrons with intense reducibility in HVs-ZIS/CIS.Consequently,the HVs-ZIS/CIS heterostructure performs a boosted H_(2)evolution activity of 33.65 mmol g^(-1)h^(-1).This work highlights the synergistic effects of defect and strong interface coupling in regulating carrier transfer and paves a brave avenue for constructing efficient heterostructure photocatalysts.展开更多
Single crystalline 3C-SiC epitaxial layers are grown on φ 50mm Si wafers by a new resistively heated CVD/LPCVD system,using SiH_4,C_2H_4 and H_2 as gas precursors.X-ray diffraction and Raman scattering measurements a...Single crystalline 3C-SiC epitaxial layers are grown on φ 50mm Si wafers by a new resistively heated CVD/LPCVD system,using SiH_4,C_2H_4 and H_2 as gas precursors.X-ray diffraction and Raman scattering measurements are used to investigate the crystallinity of the grown films.Electrical properties of the epitaxial 3C-SiC layers with thickness of 1～3μm are measured by Van der Pauw method.The improved Hall mobility reaches the highest value of 470cm 2/(V·s) at the carrier concentration of 7.7×10 17 cm -3 .展开更多
Beta-gallium oxide(β-Ga_(2)O_(3))thin films were deposited on c-plane(0001)sapphire substrates with different mis-cut angles along<>by metal-organic chemical vapor deposition(MOCVD).The structural properties an...Beta-gallium oxide(β-Ga_(2)O_(3))thin films were deposited on c-plane(0001)sapphire substrates with different mis-cut angles along<>by metal-organic chemical vapor deposition(MOCVD).The structural properties and surface morphology of as-grownβ-Ga_(2)O_(3)thin films were investigated in detail.It was found that by using thin buffer layer and mis-cut substrate technology,the full width at half maximum(FWHM)of the()diffraction peak of theβ-Ga_(2)O_(3)film is decreased from 2°on c-plane(0001)Al_(2)O_(3)substrate to 0.64°on an 8°off-angled c-plane(0001)Al_(2)O_(3)substrate.The surface root-mean-square(RMS)roughness can also be improved greatly and the value is 1.27 nm for 8°off-angled c-plane(0001)Al_(2)O_(3)substrate.Room temper-ature photoluminescence(PL)was observed,which was attributed to the self-trapped excitons formed by oxygen and gallium vacancies in the film.The ultraviolet-blue PL intensity related with oxygen and gallium vacancies is decreased with the increas-ing mis-cut angle,which is in agreement with the improved crystal quality measured by high resolution X-ray diffraction(HR-XRD).The present results provide a route for growing high qualityβ-Ga_(2)O_(3)film on Al_(2)O_(3)substrate.展开更多
Thermal transport properties of GaN heteroepitaxial structures are of critical importance for the thermal management of high-power GaN electronic and optoelectronic devices. Ultraviolet(UV) lasers are employed to dire...Thermal transport properties of GaN heteroepitaxial structures are of critical importance for the thermal management of high-power GaN electronic and optoelectronic devices. Ultraviolet(UV) lasers are employed to directly heat and sense the GaN epilayers in the transient thermoreflectance(TTR) measurement, obtaining important thermal transport properties in different GaN heterostructures, which include a diamond thin film heat spreader grown on GaN. The UV TTR technique enables rapid and non-contact thermal characterization for GaN wafers.展开更多
Single crystal PbTe thin films have been grown on BaF2 （111） by using solid source molecular beam epitaxy. The studies of evolution of the surface morphology with the increasing growth temperature from 375 to 525℃ ...Single crystal PbTe thin films have been grown on BaF2 （111） by using solid source molecular beam epitaxy. The studies of evolution of the surface morphology with the increasing growth temperature from 375 to 525℃ by AFM show that PbTe epilayers exhibit smooth surface morphologies with atomic layer scale roughness and are crack free. It is found that for PbTe grown at 475℃, the morphology is dominated by triangles and the rms roughness is 3.987nm. Compared to the rms roughnesses of 0.432nm and 0.759nm for the samples grown at 375 and 525℃ respectively, the surface of the PbTe layer grown at 475℃ is much rougher. This roughening transition is due to the interaction between the elastic relaxation and the plastic relaxation during the strain relaxation process. In contrast to the result of the morphology that the PbTe epitaxial layer grown at 375℃ has most smooth surface, as observed from the line width of x-ray diffraction curves at higher growth temperature improves the crystal quality of the single-crystalline Pb Te layer.展开更多
The Si on SiC heterojunction is still poorly understood, although it has a number of potential applications in electronic and optoelectronic devices, for example, light-activated SiC power switches where Si may play t...The Si on SiC heterojunction is still poorly understood, although it has a number of potential applications in electronic and optoelectronic devices, for example, light-activated SiC power switches where Si may play the role of an light absorbing layer. This paper reports on Si films heteroepitaxially grown on the Si face of （0001） n-type 6H-SiC substrates and the use of B2H6 as a dopant for p-Si grown at temperatures in a range of 700-950℃. X-ray diffraction （XRD） analysis and transmission electron microscopy （TEM） tests have demonstrated that the samples prepared at the temperatures ranged from 850℃ to 900℃ are characterized as monocrystalline silicon. The rocking XRD curves show a well symmetry with FWHM of 0.4339° Omega. Twin crystals and stacking faults observed in the epitaxial layers might be responsible for widening of the rocking curves. Dependence of the crystal structure and surface topography on growth temperature is discussed based on the experimental results. The energy band structure and rectifying characteristics of the Si/SiC heterojunctions are also preliminarily tested.展开更多
Growth and ordering of coherently strained Ge-rich islands in Ge/Si single layer and multilayer systems and the influence of island arrangements on the evolutio n of the surface morphology of Si cap layers during depo...Growth and ordering of coherently strained Ge-rich islands in Ge/Si single layer and multilayer systems and the influence of island arrangements on the evolutio n of the surface morphology of Si cap layers during deposition by low-pressure c hemical vapour deposition(LPCVD) on Si(001) substrates at 700℃ have been invest igated by TEM of cross-section and plan-view specimens. At distances between the Ge layers of 35-50nm, vertical order of GeSi islands is observed for Ge-Si bila yer systems and for Ge-Si multilayer systems consisting of 5 layer pairs whereas lateral ordering parallel to <100> substrate directions is observed for the lat ter case only. In agreement with earlier results the vertical ordering in the mu ltilayer system can be understood as result of the elastic interaction between i sland nuclei forming in the layers with close islands in a buried layer below. T he lateral ordering along <100> may be attributed to the anisotropy of the elast ic interaction. Characteristic for all Si surfaces are the spatial correlation b etween the presence of island-induced lattice strain and the appearance of array s of larger square-shaped pyramids with distinct faceting and facet edges along <110>. The results reflect the importance of the control of growth parameters an d of the island-induced strain state for the evolution of the Si top layer surfa ce morphology during LPCVD growth.展开更多
We successfully fabricate a high performanceβ-phase(In_(0.09)Ga_(0.91))_(2)O_(3)single-crystalline film deep ultraviolet(DUV)solar-blind photodetector.The 2-inches high crystalline quality film is hetero-grown on the...We successfully fabricate a high performanceβ-phase(In_(0.09)Ga_(0.91))_(2)O_(3)single-crystalline film deep ultraviolet(DUV)solar-blind photodetector.The 2-inches high crystalline quality film is hetero-grown on the sapphire substrates using the plasma-assisted molecular beam epitaxy(PA-MBE).The smooth InGaO single crystalline film is used to construct the solar-blind DUV detector,which utilized an interdigitated Ti/Au electrode with a metal-semiconductor-metal structure.The device exhibits a low dark current of 40 pA(0 V),while its UV photon responsivity exceeds 450 A/W(50 V)at the peak wavelength of 232 nm with illumination intensity of 0.21 m W/cm^(2)and the UV/VIS rejection ratio(R232 nm/R380 nm)exceeds 4×10^(4).Furthermore,the devices demonstrate ultrafast transient characteristics for DUV signals,with fast-rising and fast-falling times of 80 ns and 420 ns,respectively.This excellent temporal dynamic behavior can be attributed to indium doping can adjust the electronic structure of Ga_(2)O_(3)alloys to enhance the performance of InGaO solar-blind detectors.Additionally,a two-dimensional DUV scanning image is captured using the InGaO photodetector as a sensor in an imaging system.Our results pave the way for future applications of two-dimensional array DUV photodetectors based on the large-scale InGaO heteroepitaxially grown alloy wide bandgap semiconductor films.展开更多
The initial stages of multilayer Co thin film grown on Cu(111) surface were simulated by means of kinetic Monte Carlo (KMC) method, where the realistic growth model and physical parameters were presented. The effects ...The initial stages of multilayer Co thin film grown on Cu(111) surface were simulated by means of kinetic Monte Carlo (KMC) method, where the realistic growth model and physical parameters were presented. The effects of edge diffusion along the islands and mass transport between interlayers were included in the simulation model. Emphasis was placed on revealing the transition of growth morphology in heteroepitaxial Co/Cu(111) system with the changing of surface temperature. The simulation results show that the dendritic islands form at low temperature (T=210 K), while compact islands grow at room temperature (RT). The Volmer-Webber (three-dimensional, 3D) growth mode is presented due to the relative higher Ehrlich-Schwoebel (ES) barrier. Our simulation results are in good agreement with the real scanning tunneling microscopy (STM) experiments.展开更多
Shapes, dimensions, arrangements and the microstructure of self-assembled island s fabricated by low-pressure chemical vapour deposition (LPCVD) of Ge at 700℃ o nto Si(110) substrates have been investigated for diffe...Shapes, dimensions, arrangements and the microstructure of self-assembled island s fabricated by low-pressure chemical vapour deposition (LPCVD) of Ge at 700℃ o nto Si(110) substrates have been investigated for different nominal Ge coverage by transmission electron microscopy (TEM) of plan-view and cross-section specime ns and have been compared with photoluminescence (PL) measurements of Si-capped layer samples. The transition from the 2-dimensional layer to the 3-dimensional island growth mode takes place for a Ge deposition of nominally less than 2 mono layers. Upon this transition, many coherent islands and few larger islands with extended defects are observed. The coherent islands possess a dome-like shape an d lateral sizes up to 130nm. Photoluminescence spectra show island-related peaks whose energy positions are shifted towards lower energy with higher Ge coverage .展开更多
Both the electrical and optical properties are studied of the GaN：Si films with carrier concentrations ranging from 10^17cm^-3 to 10^19cm^-3.rhe results indicate that the increase in slope of carrier concentration st...Both the electrical and optical properties are studied of the GaN：Si films with carrier concentrations ranging from 10^17cm^-3 to 10^19cm^-3.rhe results indicate that the increase in slope of carrier concentration starts to slow down when the flow rate of SiH4 is larger than 6.38μmol/min, which is attributed to the amphoteric character of Si. At the same time, the photoluminescence results show that the FWHM of UV is widened,which can be interpreted quantitatively with a semi-classic model. Furthermore, the intensity ratio between the yellow and the UV luminescences reduces monotonically with Si dopants increasing.展开更多
The crystal perfection in GaP epitaxial layers was stuided by the use of double crystal X ray diffraction,backscattering spectrometry and Raman scattering techniques.GaP films grown on GaAs by low pressure metalorga...The crystal perfection in GaP epitaxial layers was stuided by the use of double crystal X ray diffraction,backscattering spectrometry and Raman scattering techniques.GaP films grown on GaAs by low pressure metalorganic chemical vapor deposition were used as the samples.By means of the morphology and the full width at half maximum of X ray diffraction peak for the GaP epilayers,the growth temperature and Ⅴ/Ⅲ ratio were optimized.In addition,the residual stress and strain of a GaP epilayer were calculated,based on Raman scattering measurement.展开更多
The heteroepitaxial growth of multilayer Cu/Pd（100） thin film via pulse laser deposition （PLD） at room temperature is simulated by using kinetic Monte Carlo （KMC） method with realistic physical parameters. The e...The heteroepitaxial growth of multilayer Cu/Pd（100） thin film via pulse laser deposition （PLD） at room temperature is simulated by using kinetic Monte Carlo （KMC） method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model, Emphasis is placed on revealing the details of multilayer Cu/Pd（100） thin film growth and estimating the Ehrlich-Schwoebel （ES） barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers （ML） of Cu/Pd（100）. The ES barriers of 0.08 ± 0.01 eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy （STM） measurements,展开更多
The epitaxial relationships of lattices and crystalline qualities of LSMO/ZnO/sapphire double-hetero systems were thoroughly analyzed using X-ray diffraction techniques with a modern high resolution XRD system. It was...The epitaxial relationships of lattices and crystalline qualities of LSMO/ZnO/sapphire double-hetero systems were thoroughly analyzed using X-ray diffraction techniques with a modern high resolution XRD system. It was revealed that the epitaxial growth of the LSMO (110) phase was promoted under higher temperature accompanying the suppression of other competitive growth of the LSMO (001) and (111) phases. Supplying the plasma oxygen accelerated the suppression of the LSMO (111) phase. The complex epitaxial orientational relationships in these three growth modes were revealed from the precise analyses with the high resolution out-of-plane XRD and the in-plane XRD measurements, pole figure measurements, and reciprocal space mappings measurements, as [112ˉ](111)LSMO//[11ˉ00](0001)ZnO//[112ˉ0](0001)Sap, [110ˉ](111LSMO)//[11ˉ00](0001)Zno//[112ˉ0](0001)Sap, and [110](001)LSMO//[11ˉ00](0001)Zno//[112ˉ0](0001)Sap. The validity of this model for the epitaxial orientational relationships in LSMO/ZnO/sapphire double heteroepitaxial layers was confirmed identically with the data ana- lyses of the out-of-plane wide-range Reciprocal Space Mapping using the 2-dimensional X-ray detector.展开更多
基金Project supported by the National Basic Research Program of China (Grant No.2007CB307004)the National High Technology Research and Development Program of China (Grant No.2009AA03A198)+1 种基金the National Natural Science Foundation of China (Grant Nos.60776041 61076012,60876063,and 60676032)the Science and Technology Fund of Beijing,China (Grant No.Z101103050410003)
文摘Two strain-state samples of GaN, labelled the strain-relief sample and the quality-improved sample, were grown by hydride vapour phase epitaxy （HVPE）, and then characterized by high-resolution X-ray diffraction, photoluminescence and optical microscopy. Two strain states of GaN in HVPE, like 3D and 2[） growth modes in metal-organic chemical vapour deposition （MOCVD）, provide an effective way to solve the heteroepitaxial problems of both strain relief and quality improvement. The gradual variation metbod （GVM）, developed based on the two strain states, is characterized by growth parameters＇ gradual variation alternating between the strain-relief growth conditions and the quality-improved growth conditions. In GVM, the introduction of the strain-relief amplitude, which is defined by the range from the quality-improved growth conditions to the strain-relief growth conditions, makes the strain-relief control concise and effective. The 300-μm thick bright and crack-free GaN film grown on a two-inch sapphire proves the effectiveness of GVM.
文摘The heteroepitaxy of semiconductor thin films is a cornerstone of semiconductor devices and is naturally preferred to grow on matched substrates from the view point of material epitaxy. However, the heteroepitaxy is always performed on mismatched substrates due to the limited choices of mature substrates, which constrains the quality of semiconductor thin films.
文摘The present understanding of diamond heteroepitaxy by bias-enhanced chemical vapour deposition on technologically relevant substrate materials is briefly reviewed. First the early stages of diamond nucleation and the diamond film growth as well as influences of various deposition conditions are described. Then the results of microscopic investigations of the structure of interfaces and of grain boundaries are summarized.
文摘The mechanism of chemical-vapor-deposited (CVD) diamond film growth has attracted increasing attention recent years, mainly due to the fact that further technological advancement (such as obtaining high-quality films, controlling film growth, and heteroepitaxial growth, etc.) requires a more detailed understanding of the fundamental phenomena responsible for diamond growth.
基金Supported by the Research Project of the Ministry of Education of China (Grant No. 02018)the Beijing Natural Science Foundation (Grant No. 2072014)
文摘Diamond and cubic boron nitride films have already been applied practically be- cause of their excellent properties. The specific orientations of the films have spe- cial meaning on their application in optics and microelectronics fields. In this paper, the relative electron density differences of the interface between the different crystal planes of silicon substrate and those of diamond and cubic boron films are calculated with the empirical electron theory in solids and molecules. Analyses on the calculation results show that in the range of the researched films, the smaller the relative electron density difference between the film and the substrate is, the stabler the film is in thermodynamics. Therefore, the electron density difference is the essential factor of determining the orientation of the texture and heteroepitaxy of the films. The deductions accord well with the experimental facts. The calcula- tion methods and the theory not only provide a new angle of view for the research of the growth mechanism of diamond film and cubic boron nitride film on the sili- con substrate, but also provide a possible direction for the prediction of the orien- tation of other films.
基金supported by the National Natural Science Foundation of China (Grant Nos. 51075335,51174168,10902086 and 50875217)the Northwestern Polytechnical University Foundation for Fundamental Research (Grant Nos. 201109 and NPU-FFR-JC201005)
文摘The phase-field crystal(PFC) model is employed to study the shape transition of strained islands in heteroepitaxy on vicinal substrates.The influences of both substrate vicinal angles β and the lattice mismatch ξ are discussed.The increase of substrate vicinal angles is found to be capable of significantly changing the surface nanostructures of epitaxial films.The surface morphology of films undergoes a series of transitions that include Stranski-Krastonov(SK) islands,the couple growth of islands and the step flow as well as the formation of step bunching.In addition,the larger ξ indicates an increased strained island density after coarsening,and results in the incoherent growth of strained islands with the creation of misfit dislocations.Coarsening,coalescence and faceting of strained islands are also observed.Some facets in the shape transition of strained islands are found to be stable and can be determined by β and crystal symmetry of the film.
基金supported by the National Natural Science Foundation of China(52072196,52002200,52102106,52202262,22379081,22379080)the Major Basic Research Program of Natural Science Foundation of Shandong Province(ZR2020ZD09)+1 种基金the Natural Science Foundation of Shandong Province(ZR2020QE063,ZR202108180009,ZR2023QE059)the Project funded by China Postdoctoral Science Foundation(2023M741871)。
文摘Steering the directional carrier migration across the interface is a central mission for efficient photocatalytic reactions.In this work,an atomic-shared heterointerface is constructed between the defect-rich ZnIn_(2)S_(4)(HVs-ZIS)and CoIn_(2)S_(4)(CIS)via a defect-guided heteroepitaxial growth strategy.The strong interface coupling induces adequate carriers exchanging passageway between HVs-ZIS and CIS,enhancing the internal electric field(IEF)in the ZnIn_(2)S_(4)/CoIn_(2)S_(4)(HVs-ZIS/CIS)heterostructure.The defect structure in HVs-ZIS induces an additional defect level,improving the separation efficiency of photocarriers.Moreover,promoted by the IEF and intimate heterointerface,photogenerated electrons trapped by the defect level can migrate to the valence band of CIS,contributing to massive photogenerated electrons with intense reducibility in HVs-ZIS/CIS.Consequently,the HVs-ZIS/CIS heterostructure performs a boosted H_(2)evolution activity of 33.65 mmol g^(-1)h^(-1).This work highlights the synergistic effects of defect and strong interface coupling in regulating carrier transfer and paves a brave avenue for constructing efficient heterostructure photocatalysts.
文摘Single crystalline 3C-SiC epitaxial layers are grown on φ 50mm Si wafers by a new resistively heated CVD/LPCVD system,using SiH_4,C_2H_4 and H_2 as gas precursors.X-ray diffraction and Raman scattering measurements are used to investigate the crystallinity of the grown films.Electrical properties of the epitaxial 3C-SiC layers with thickness of 1～3μm are measured by Van der Pauw method.The improved Hall mobility reaches the highest value of 470cm 2/(V·s) at the carrier concentration of 7.7×10 17 cm -3 .
基金the National Key Research and Development Program of China(Grant No.2018YFB2200500)the National Natural Science Foundation(Grant Nos.62050073,62090054,61975196).
文摘Beta-gallium oxide(β-Ga_(2)O_(3))thin films were deposited on c-plane(0001)sapphire substrates with different mis-cut angles along<>by metal-organic chemical vapor deposition(MOCVD).The structural properties and surface morphology of as-grownβ-Ga_(2)O_(3)thin films were investigated in detail.It was found that by using thin buffer layer and mis-cut substrate technology,the full width at half maximum(FWHM)of the()diffraction peak of theβ-Ga_(2)O_(3)film is decreased from 2°on c-plane(0001)Al_(2)O_(3)substrate to 0.64°on an 8°off-angled c-plane(0001)Al_(2)O_(3)substrate.The surface root-mean-square(RMS)roughness can also be improved greatly and the value is 1.27 nm for 8°off-angled c-plane(0001)Al_(2)O_(3)substrate.Room temper-ature photoluminescence(PL)was observed,which was attributed to the self-trapped excitons formed by oxygen and gallium vacancies in the film.The ultraviolet-blue PL intensity related with oxygen and gallium vacancies is decreased with the increas-ing mis-cut angle,which is in agreement with the improved crystal quality measured by high resolution X-ray diffraction(HR-XRD).The present results provide a route for growing high qualityβ-Ga_(2)O_(3)film on Al_(2)O_(3)substrate.
基金Project supported by the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.61604049)the Shenzhen Municipal Research Project(Grant No.JCYJ20160531192714636)
文摘Thermal transport properties of GaN heteroepitaxial structures are of critical importance for the thermal management of high-power GaN electronic and optoelectronic devices. Ultraviolet(UV) lasers are employed to directly heat and sense the GaN epilayers in the transient thermoreflectance(TTR) measurement, obtaining important thermal transport properties in different GaN heterostructures, which include a diamond thin film heat spreader grown on GaN. The UV TTR technique enables rapid and non-contact thermal characterization for GaN wafers.
基金Supported by the National Natural Science Foundation of China under Grant No 10434090.
文摘Single crystal PbTe thin films have been grown on BaF2 （111） by using solid source molecular beam epitaxy. The studies of evolution of the surface morphology with the increasing growth temperature from 375 to 525℃ by AFM show that PbTe epilayers exhibit smooth surface morphologies with atomic layer scale roughness and are crack free. It is found that for PbTe grown at 475℃, the morphology is dominated by triangles and the rms roughness is 3.987nm. Compared to the rms roughnesses of 0.432nm and 0.759nm for the samples grown at 375 and 525℃ respectively, the surface of the PbTe layer grown at 475℃ is much rougher. This roughening transition is due to the interaction between the elastic relaxation and the plastic relaxation during the strain relaxation process. In contrast to the result of the morphology that the PbTe epitaxial layer grown at 375℃ has most smooth surface, as observed from the line width of x-ray diffraction curves at higher growth temperature improves the crystal quality of the single-crystalline Pb Te layer.
基金Project supported by the National Natural Science Foundation of China (Grant No 60576044)
文摘The Si on SiC heterojunction is still poorly understood, although it has a number of potential applications in electronic and optoelectronic devices, for example, light-activated SiC power switches where Si may play the role of an light absorbing layer. This paper reports on Si films heteroepitaxially grown on the Si face of （0001） n-type 6H-SiC substrates and the use of B2H6 as a dopant for p-Si grown at temperatures in a range of 700-950℃. X-ray diffraction （XRD） analysis and transmission electron microscopy （TEM） tests have demonstrated that the samples prepared at the temperatures ranged from 850℃ to 900℃ are characterized as monocrystalline silicon. The rocking XRD curves show a well symmetry with FWHM of 0.4339° Omega. Twin crystals and stacking faults observed in the epitaxial layers might be responsible for widening of the rocking curves. Dependence of the crystal structure and surface topography on growth temperature is discussed based on the experimental results. The energy band structure and rectifying characteristics of the Si/SiC heterojunctions are also preliminarily tested.
文摘Growth and ordering of coherently strained Ge-rich islands in Ge/Si single layer and multilayer systems and the influence of island arrangements on the evolutio n of the surface morphology of Si cap layers during deposition by low-pressure c hemical vapour deposition(LPCVD) on Si(001) substrates at 700℃ have been invest igated by TEM of cross-section and plan-view specimens. At distances between the Ge layers of 35-50nm, vertical order of GeSi islands is observed for Ge-Si bila yer systems and for Ge-Si multilayer systems consisting of 5 layer pairs whereas lateral ordering parallel to <100> substrate directions is observed for the lat ter case only. In agreement with earlier results the vertical ordering in the mu ltilayer system can be understood as result of the elastic interaction between i sland nuclei forming in the layers with close islands in a buried layer below. T he lateral ordering along <100> may be attributed to the anisotropy of the elast ic interaction. Characteristic for all Si surfaces are the spatial correlation b etween the presence of island-induced lattice strain and the appearance of array s of larger square-shaped pyramids with distinct faceting and facet edges along <110>. The results reflect the importance of the control of growth parameters an d of the island-induced strain state for the evolution of the Si top layer surfa ce morphology during LPCVD growth.
基金the National Natural Science Foundation of China(Grant Nos.U22A2073,11974433,91833301,and 11974122)。
文摘We successfully fabricate a high performanceβ-phase(In_(0.09)Ga_(0.91))_(2)O_(3)single-crystalline film deep ultraviolet(DUV)solar-blind photodetector.The 2-inches high crystalline quality film is hetero-grown on the sapphire substrates using the plasma-assisted molecular beam epitaxy(PA-MBE).The smooth InGaO single crystalline film is used to construct the solar-blind DUV detector,which utilized an interdigitated Ti/Au electrode with a metal-semiconductor-metal structure.The device exhibits a low dark current of 40 pA(0 V),while its UV photon responsivity exceeds 450 A/W(50 V)at the peak wavelength of 232 nm with illumination intensity of 0.21 m W/cm^(2)and the UV/VIS rejection ratio(R232 nm/R380 nm)exceeds 4×10^(4).Furthermore,the devices demonstrate ultrafast transient characteristics for DUV signals,with fast-rising and fast-falling times of 80 ns and 420 ns,respectively.This excellent temporal dynamic behavior can be attributed to indium doping can adjust the electronic structure of Ga_(2)O_(3)alloys to enhance the performance of InGaO solar-blind detectors.Additionally,a two-dimensional DUV scanning image is captured using the InGaO photodetector as a sensor in an imaging system.Our results pave the way for future applications of two-dimensional array DUV photodetectors based on the large-scale InGaO heteroepitaxially grown alloy wide bandgap semiconductor films.
基金This was work was supported by the Natural Science Foundation for Young Scientists of Zhejiang Province (No.RC02069).
文摘The initial stages of multilayer Co thin film grown on Cu(111) surface were simulated by means of kinetic Monte Carlo (KMC) method, where the realistic growth model and physical parameters were presented. The effects of edge diffusion along the islands and mass transport between interlayers were included in the simulation model. Emphasis was placed on revealing the transition of growth morphology in heteroepitaxial Co/Cu(111) system with the changing of surface temperature. The simulation results show that the dendritic islands form at low temperature (T=210 K), while compact islands grow at room temperature (RT). The Volmer-Webber (three-dimensional, 3D) growth mode is presented due to the relative higher Ehrlich-Schwoebel (ES) barrier. Our simulation results are in good agreement with the real scanning tunneling microscopy (STM) experiments.
文摘Shapes, dimensions, arrangements and the microstructure of self-assembled island s fabricated by low-pressure chemical vapour deposition (LPCVD) of Ge at 700℃ o nto Si(110) substrates have been investigated for different nominal Ge coverage by transmission electron microscopy (TEM) of plan-view and cross-section specime ns and have been compared with photoluminescence (PL) measurements of Si-capped layer samples. The transition from the 2-dimensional layer to the 3-dimensional island growth mode takes place for a Ge deposition of nominally less than 2 mono layers. Upon this transition, many coherent islands and few larger islands with extended defects are observed. The coherent islands possess a dome-like shape an d lateral sizes up to 130nm. Photoluminescence spectra show island-related peaks whose energy positions are shifted towards lower energy with higher Ge coverage .
文摘Both the electrical and optical properties are studied of the GaN：Si films with carrier concentrations ranging from 10^17cm^-3 to 10^19cm^-3.rhe results indicate that the increase in slope of carrier concentration starts to slow down when the flow rate of SiH4 is larger than 6.38μmol/min, which is attributed to the amphoteric character of Si. At the same time, the photoluminescence results show that the FWHM of UV is widened,which can be interpreted quantitatively with a semi-classic model. Furthermore, the intensity ratio between the yellow and the UV luminescences reduces monotonically with Si dopants increasing.
文摘The crystal perfection in GaP epitaxial layers was stuided by the use of double crystal X ray diffraction,backscattering spectrometry and Raman scattering techniques.GaP films grown on GaAs by low pressure metalorganic chemical vapor deposition were used as the samples.By means of the morphology and the full width at half maximum of X ray diffraction peak for the GaP epilayers,the growth temperature and Ⅴ/Ⅲ ratio were optimized.In addition,the residual stress and strain of a GaP epilayer were calculated,based on Raman scattering measurement.
基金Project supported by the State Key Development Program for Basic Research of China （Grant No 2006CB708612） and Natural Science Foundation for Young Scientists of Zhejiang Province, China （Grant No RC02069）.Acknowledgment We would like to thank Dr Ling-wang Wang of the Computational Research Division at the Lawrence Berkeley National Lab and Dr Xiangrong Ye of Department of Material Science and Chemical Engineering, University of California at San Diego for helpful discussion.
文摘The heteroepitaxial growth of multilayer Cu/Pd（100） thin film via pulse laser deposition （PLD） at room temperature is simulated by using kinetic Monte Carlo （KMC） method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model, Emphasis is placed on revealing the details of multilayer Cu/Pd（100） thin film growth and estimating the Ehrlich-Schwoebel （ES） barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers （ML） of Cu/Pd（100）. The ES barriers of 0.08 ± 0.01 eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy （STM） measurements,
文摘The epitaxial relationships of lattices and crystalline qualities of LSMO/ZnO/sapphire double-hetero systems were thoroughly analyzed using X-ray diffraction techniques with a modern high resolution XRD system. It was revealed that the epitaxial growth of the LSMO (110) phase was promoted under higher temperature accompanying the suppression of other competitive growth of the LSMO (001) and (111) phases. Supplying the plasma oxygen accelerated the suppression of the LSMO (111) phase. The complex epitaxial orientational relationships in these three growth modes were revealed from the precise analyses with the high resolution out-of-plane XRD and the in-plane XRD measurements, pole figure measurements, and reciprocal space mappings measurements, as [112ˉ](111)LSMO//[11ˉ00](0001)ZnO//[112ˉ0](0001)Sap, [110ˉ](111LSMO)//[11ˉ00](0001)Zno//[112ˉ0](0001)Sap, and [110](001)LSMO//[11ˉ00](0001)Zno//[112ˉ0](0001)Sap. The validity of this model for the epitaxial orientational relationships in LSMO/ZnO/sapphire double heteroepitaxial layers was confirmed identically with the data ana- lyses of the out-of-plane wide-range Reciprocal Space Mapping using the 2-dimensional X-ray detector.
