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掺杂纳米硅薄膜微结构的研究 被引量:12
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作者 王金良 徐刚毅 王天民 《自然科学进展(国家重点实验室通讯)》 北大核心 2001年第3期331-336,共6页
采用等离子增强化学气相沉积(PECVD)方法成功地沉积出掺杂(主要是磷、硼)纳米硅(nc-Si:H)薄膜。利用高分辨电子显微镜(HREM)、Raman散射、X射线衍射(XRD)、Auger电子谱(AES)和共振核反应(RNR)等手段对掺入不同杂质后的纳米硅薄膜的微结... 采用等离子增强化学气相沉积(PECVD)方法成功地沉积出掺杂(主要是磷、硼)纳米硅(nc-Si:H)薄膜。利用高分辨电子显微镜(HREM)、Raman散射、X射线衍射(XRD)、Auger电子谱(AES)和共振核反应(RNR)等手段对掺入不同杂质后的纳米硅薄膜的微结构进行了系统的研究,实验结果表明,随着掺磷浓度的增加,掺杂纳米硅薄膜的晶粒尺寸减小,晶态比和晶粒密度增加。而随着掺硼浓度的增加,掺杂纳米硅薄膜的晶粒尺寸没有变化,晶态比减小,掺硼浓度达到一定程度时,则变成了非晶硅薄膜。 展开更多
关键词 等离子增强化学气相沉积 掺杂纳米硅薄膜 微结构 晶粒尺寸 晶态比 晶粒密度 半导体纳米材料
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Direct low-temperature synthesis of graphene on various glasses by plasma-enhanced chemical vapor deposition for versatile, cost-effective electrodes 被引量:14
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作者 Jingyu Sun Yubin Chen +11 位作者 Xin Cai Bangjun Ma Zhaolong Chen Manish Kr. Priydarshi Ke Chen Teng Gao Xiuju Song Qingqing Ji Xuefeng Guo Dechun Zou Yanfeng Zhang Zhongfan Liu 《Nano Research》 SCIE EI CAS CSCD 2015年第11期3496-3504,共9页
Catalyst-free and scalable synthesis of graphene on various glass substrates at low temperatures is of paramount significance to numerous applications such as low-cost transparent electronics and state-of-the-art disp... Catalyst-free and scalable synthesis of graphene on various glass substrates at low temperatures is of paramount significance to numerous applications such as low-cost transparent electronics and state-of-the-art displays. However, systematic study within this promising research field has remained scarce thus far. Herein, we report the direct growth of graphene on various glasses using a low-temperature plasma-enhanced chemical vapor deposition method. Such a facile and scalable approach guarantees the growth of uniform, transfer-free graphene films on various glass substrates at a growth temperature range of 400-600 ℃. The morphological, surface wetting, optical, and electrical properties of the obtained graphene can be tailored by controlling the growth parameters. Our uniform and high-quality graphene films directly integrated with low-cost, commonly used glasses show great potential in the fabrication of multi-functional electrodes for versatile applications in solar cells, transparent electronics, and smart windows. 展开更多
关键词 GRAPHENE DIRECT plasma-enhanced chemical vapor deposition (PECVD) glass VARIOUS low-cost
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作者 Johan Liu Mervi Paulasto-Krckel 《Advances in Manufacturing》 SCIE CAS 2013年第3期197-197,共1页
Manufacturing technologies for making advanced micro systems have been developing in a rapid pace recently. Research progress towards nanosized structures and devices opens up a whole new horizon for miniaturized syst... Manufacturing technologies for making advanced micro systems have been developing in a rapid pace recently. Research progress towards nanosized structures and devices opens up a whole new horizon for miniaturized system integration. Advances in this field will have an enormous societal impact and economic benefit in areas such as information technology, energy, healthcare, and many more. There has been an enormous scientific and industrial interest in nanosized advanced technologies. The theories, tools and practices for the design, manufacturing and test of these systems are emerging. The aim of this special section is to capture some of the latest developments in integration technologies for the micro/nanosystems, with the following topics: Molecular and crystal assembly inside the carbon nanotube: encapsulation and manufacturing approachesElectroplating for high aspect ratio vias in PCB manufacturing: enhancement capabilities of acoustic streaming Local synthesis of carbon nanotubes for direct integra tion in Si microsystemsdesign considerations Waferlevel SLID bonding for MEMS encapsulation Effect of substrates and underlayer on CNT synthesis by plasma enhanced CVD These papers will briefly highlight important advance ments in manufacturing technologies of the micro/nano systems, and outline the blueprint of upcoming information technology revolution from the manufacturing point of view. 展开更多
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