To prolong the service life of optics,the feasibility of in situ cleaning of the multilayer mirror(MLM)of tin and its oxidized contamination was investigated using hydrogen plasma at different power levels.Granular ti...To prolong the service life of optics,the feasibility of in situ cleaning of the multilayer mirror(MLM)of tin and its oxidized contamination was investigated using hydrogen plasma at different power levels.Granular tin-based contamination consisting of micro-and macroparticles was deposited on silicon via physical vapor deposition(PVD).The electrodedriven hydrogen plasma at different power levels was systematically diagnosed using a Langmuir probe and a retarding field ion energy analyzer(RFEA).Moreover,the magnitude of the self-biasing voltage was measured at different power levels,and the peak ion energy was corrected for the difference between the RFEA measurements and the self-biasing voltage(E_(RFEA)-eV_(self)).XPS analysis of O 1s and Sn 3d peaks demonstrated the chemical reduction process after 1 W cleaning.Analysis of surface and cross-section morphology revealed that holes emerged on the upper part of the macroparticles while its bottom remained smooth.Hills and folds appeared on the upper part of the microparticles,confirming the top-down cleaning mode with hydrogen plasma.This study provides an in situ electrode-driven hydrogen plasma etching process for tin-based contamination and will provide meaningful guidance for understanding the chemical mechanism of reduction and etching.展开更多
Atmospheric pressure plasma jet(APPJ)was used to clean nitrogen-containing carbon films(C–N)fabricated by plasma-assisted chemical vapor deposition method employing the plasma surface interaction linear device at Sic...Atmospheric pressure plasma jet(APPJ)was used to clean nitrogen-containing carbon films(C–N)fabricated by plasma-assisted chemical vapor deposition method employing the plasma surface interaction linear device at Sichuan University(SCU-PSI).The properties of the contaminated films on the surface of pristine and He-plasma pre-irradiated tungsten matrix,such as morphology,crystalline structure,element composition and chemical structure were characterized by scanning electron microscopy,grazing incidence x-ray diffraction and x-ray photoelectron spectroscopy.The experimental results revealed that the removal of C–N film with a thickness of tens of microns can be realized through APPJ cleaning regardless of the morphology of the substrates.Similar removal rates of 16.82 and 13.78μm min^(-1)were obtained for C–N films deposited on a smooth pristine W surface and rough fuzz-covered W surface,respectively.This is a remarkable improvement in comparison to the traditional cleaning method.However,slight surface oxidation was found after APPJ cleaning,but the degree of oxidation was acceptable with an oxidation depth increase of only 3.15 nm.Optical emission spectroscopy analysis and mass spectrometry analysis showed that C–N contamination was mainly removed through chemical reaction with reactive oxygen species during APPJ treatment using air as the working gas.These results make APPJ cleaning a potentially effective method for the rapid removal of C–N films from the wall surfaces of fusion devices.展开更多
Self-cleaning of tin contaminants was realized utilizing a self-driven hydrogen plasma.Cleaning rates of 0.7-6 nm min-1were achieved for removal of discontinuous tin particles at different powers.The analysis of topog...Self-cleaning of tin contaminants was realized utilizing a self-driven hydrogen plasma.Cleaning rates of 0.7-6 nm min-1were achieved for removal of discontinuous tin particles at different powers.The analysis of topography and cross-sectional morphology revealed that the removal of tin particles was achieved through top-down cleaning with hydrogen plasma,where the upper part of spherical tin particles was always more intensely cleaned under the synergistic effect of hydrogen atoms and ions due to the vertical incidence of ions to the substrate during the whole cleaning process.Redeposition of tin atoms caused by physical sputtering and its promotion of the chemical cleaning effect was observed for the first time.Reflectance recovery measurements during cleaning and surface analysis of the substrate after cleaning indicated that nondestructive cleaning with a reflectance loss of less than 1%can be achieved at a relatively low power of120 W.Plasma-induced substrate damage,such as holes and valleys,reduced the reflectance of the substrate when cleaning was performed at a high power greater than 120 W,so this method should only be considered for application under conditions without substrate exposure.This study provides a comprehensive understanding of the removal of discontinuous tin particles using the in situ self-driven plasma cleaning method,and also provides meaningful guidance for the extension of this method in other potential fields of application.展开更多
基金funded by the Institutional Research Fund from Sichuan University(No.2020SCUNL211)。
文摘To prolong the service life of optics,the feasibility of in situ cleaning of the multilayer mirror(MLM)of tin and its oxidized contamination was investigated using hydrogen plasma at different power levels.Granular tin-based contamination consisting of micro-and macroparticles was deposited on silicon via physical vapor deposition(PVD).The electrodedriven hydrogen plasma at different power levels was systematically diagnosed using a Langmuir probe and a retarding field ion energy analyzer(RFEA).Moreover,the magnitude of the self-biasing voltage was measured at different power levels,and the peak ion energy was corrected for the difference between the RFEA measurements and the self-biasing voltage(E_(RFEA)-eV_(self)).XPS analysis of O 1s and Sn 3d peaks demonstrated the chemical reduction process after 1 W cleaning.Analysis of surface and cross-section morphology revealed that holes emerged on the upper part of the macroparticles while its bottom remained smooth.Hills and folds appeared on the upper part of the microparticles,confirming the top-down cleaning mode with hydrogen plasma.This study provides an in situ electrode-driven hydrogen plasma etching process for tin-based contamination and will provide meaningful guidance for understanding the chemical mechanism of reduction and etching.
基金funded by National Key Research, Development Program of China (No. 2017YFE0301305KYWX-002)Sichuan Science and Technology Program (No. 2021YFSY0015)
文摘Atmospheric pressure plasma jet(APPJ)was used to clean nitrogen-containing carbon films(C–N)fabricated by plasma-assisted chemical vapor deposition method employing the plasma surface interaction linear device at Sichuan University(SCU-PSI).The properties of the contaminated films on the surface of pristine and He-plasma pre-irradiated tungsten matrix,such as morphology,crystalline structure,element composition and chemical structure were characterized by scanning electron microscopy,grazing incidence x-ray diffraction and x-ray photoelectron spectroscopy.The experimental results revealed that the removal of C–N film with a thickness of tens of microns can be realized through APPJ cleaning regardless of the morphology of the substrates.Similar removal rates of 16.82 and 13.78μm min^(-1)were obtained for C–N films deposited on a smooth pristine W surface and rough fuzz-covered W surface,respectively.This is a remarkable improvement in comparison to the traditional cleaning method.However,slight surface oxidation was found after APPJ cleaning,but the degree of oxidation was acceptable with an oxidation depth increase of only 3.15 nm.Optical emission spectroscopy analysis and mass spectrometry analysis showed that C–N contamination was mainly removed through chemical reaction with reactive oxygen species during APPJ treatment using air as the working gas.These results make APPJ cleaning a potentially effective method for the rapid removal of C–N films from the wall surfaces of fusion devices.
基金National Key Research,Development Program of China(No.2017YFE0301305KYWX-002)Sichuan Science and Technology Program(No.2021YFSY0015)Institutional Research Fund from Sichuan University(No.2020SCUNL211)。
文摘Self-cleaning of tin contaminants was realized utilizing a self-driven hydrogen plasma.Cleaning rates of 0.7-6 nm min-1were achieved for removal of discontinuous tin particles at different powers.The analysis of topography and cross-sectional morphology revealed that the removal of tin particles was achieved through top-down cleaning with hydrogen plasma,where the upper part of spherical tin particles was always more intensely cleaned under the synergistic effect of hydrogen atoms and ions due to the vertical incidence of ions to the substrate during the whole cleaning process.Redeposition of tin atoms caused by physical sputtering and its promotion of the chemical cleaning effect was observed for the first time.Reflectance recovery measurements during cleaning and surface analysis of the substrate after cleaning indicated that nondestructive cleaning with a reflectance loss of less than 1%can be achieved at a relatively low power of120 W.Plasma-induced substrate damage,such as holes and valleys,reduced the reflectance of the substrate when cleaning was performed at a high power greater than 120 W,so this method should only be considered for application under conditions without substrate exposure.This study provides a comprehensive understanding of the removal of discontinuous tin particles using the in situ self-driven plasma cleaning method,and also provides meaningful guidance for the extension of this method in other potential fields of application.
