Structured illumination microscopy(SIM)is one of the most widely applied wide field super resolution imaging techniques with high temporal resolution and low phototoxicity.The spatial resolution of SIM is typically li...Structured illumination microscopy(SIM)is one of the most widely applied wide field super resolution imaging techniques with high temporal resolution and low phototoxicity.The spatial resolution of SIM is typically limited to two times of the diffraction limit and the depth of field is small.In this work,we propose and experimentally demonstrate a low cost,easy to implement,novel technique called speckle structured illumination endoscopy(SSIE)to enhance the resolution of a wide field endoscope with large depth of field.Here,speckle patterns are used to excite objects on the sample which is then followed by a blind-SIM algorithm for super resolution image reconstruction.Our approach is insensitive to the 3D morphology of the specimen,or the deformation of illuminations used.It greatly simplifies the experimental setup as there are no calibration protocols and no stringent control of illumination patterns nor focusing optics.We demonstrate that the SSIE can enhance the resolution 2–4.5 times that of a standard white light endoscopic(WLE)system.The SSIE presents a unique route to super resolution in endoscopic imaging at wide field of view and depth of field,which might be beneficial to the practice of clinical endoscopy.展开更多
Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shi...Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics,culminating in the development of flat and ultrathin optical devices.Particularly noteworthy is the all-dielectric-based metasurface,leveraging materials such as titanium dioxide,silicon,gallium arsenide,and silicon nitride,which finds extensive application in the design and implementation of high-performance optical devices,owing to its notable advantages,including a high refractive index,low ohmic loss,and cost-effectiveness.Furthermore,the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication,especially through wafer-scale nanofabrication technologies,thereby facilitating the realization of commercial applications for metasurfaces.This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas.These technologies,including standard nanolithography[e.g.,electron beam lithography(EBL)and focused ion beam(FIB)lithography],advanced nanolithography(e.g.,grayscale and scanning probe lithography),and large-scale nanolithography[e.g.,nanoimprint and deep ultraviolet(DUV)lithography],are utilized to fabricate highresolution,high-aspect-ratio,flexible,multilayer,slanted,and wafer-scale all-dielectric metasurfaces with intricate nanostructures.Ultimately,we conclude with a perspective on current cutting-edge nanofabrication technologies.展开更多
基金partially supported by the Gordon and Betty Moore Foundation Grant No.5722
文摘Structured illumination microscopy(SIM)is one of the most widely applied wide field super resolution imaging techniques with high temporal resolution and low phototoxicity.The spatial resolution of SIM is typically limited to two times of the diffraction limit and the depth of field is small.In this work,we propose and experimentally demonstrate a low cost,easy to implement,novel technique called speckle structured illumination endoscopy(SSIE)to enhance the resolution of a wide field endoscope with large depth of field.Here,speckle patterns are used to excite objects on the sample which is then followed by a blind-SIM algorithm for super resolution image reconstruction.Our approach is insensitive to the 3D morphology of the specimen,or the deformation of illuminations used.It greatly simplifies the experimental setup as there are no calibration protocols and no stringent control of illumination patterns nor focusing optics.We demonstrate that the SSIE can enhance the resolution 2–4.5 times that of a standard white light endoscopic(WLE)system.The SSIE presents a unique route to super resolution in endoscopic imaging at wide field of view and depth of field,which might be beneficial to the practice of clinical endoscopy.
基金supported by the National Key Research and Development Project of China (Nos.2022YFA1404700,2023YFB2806700,and 2021YFA1400802)National Natural Science Foundation of China (Nos.6233000076,12334016,12025402,62125501,11934012,12261131500,92250302,and 62375232)+3 种基金Shenzhen Fundamental Research Project (Nos.JCYJ20210324120402006,JCYJ20220818102218040,and GXWD20220817145518001)University Grants Committee/Research Grants Council of the Hong Kong Special Administrative Region,China (Project No.AoE/P-502/20,CRF Project Nos.C5031-22G and C1015-21E,GRF Project Nos.CityU15303521 and CityU11305223and Germany/Hong Kong Joint Research Scheme:GCityU101/22)Project of City University of Hong Kong (Nos.9380131,9610628,and 7005867).
文摘Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics,culminating in the development of flat and ultrathin optical devices.Particularly noteworthy is the all-dielectric-based metasurface,leveraging materials such as titanium dioxide,silicon,gallium arsenide,and silicon nitride,which finds extensive application in the design and implementation of high-performance optical devices,owing to its notable advantages,including a high refractive index,low ohmic loss,and cost-effectiveness.Furthermore,the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication,especially through wafer-scale nanofabrication technologies,thereby facilitating the realization of commercial applications for metasurfaces.This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas.These technologies,including standard nanolithography[e.g.,electron beam lithography(EBL)and focused ion beam(FIB)lithography],advanced nanolithography(e.g.,grayscale and scanning probe lithography),and large-scale nanolithography[e.g.,nanoimprint and deep ultraviolet(DUV)lithography],are utilized to fabricate highresolution,high-aspect-ratio,flexible,multilayer,slanted,and wafer-scale all-dielectric metasurfaces with intricate nanostructures.Ultimately,we conclude with a perspective on current cutting-edge nanofabrication technologies.
