In order to study the effect of the microstructure with Al and V added TiN coatings, TiN, TiAlN and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of ...In order to study the effect of the microstructure with Al and V added TiN coatings, TiN, TiAlN and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of all the coatings were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results indicate that the addition of Al into TiN coatings reduces their lattice constant, but a further addition of V into TiAlN coatings increases their lattice constant. Moreover, the growth morphologies for TiN, TiAlN, and TiAlVN indicate that adding Al and V has a tendency to improve the columnar structure. The (111) and (200) orientations of TiN, TiAlN, and TiAlVN are identified. Theε(Fe3N-Fe2N) phase occurs because a small amount of Fe is present in the coatings. The interlayers of TiAlN and TiAlVN have the preferred (01 1 0) orientation. The texture (columnar) structure of the (111) and (200) orientations is observed in the TiAlN and TiAlVN coatings. An orientation relationship of (01 1 0)α-Ti//(110)T.M occurs between the interlayer and tempered martensite (T.M) in TiAlVN.展开更多
采用热反应扩散沉积法(TRD)对有无预渗氮处理的SKD11钢试样分别以950、900、850、800和750℃进行气体热渗铬。利用SEM和EDS测量铬原子扩散深度;根据经典动力学理论计算活化能及扩散系数;利用XRD分析相结构;再进行维氏硬度测量和耐磨实...采用热反应扩散沉积法(TRD)对有无预渗氮处理的SKD11钢试样分别以950、900、850、800和750℃进行气体热渗铬。利用SEM和EDS测量铬原子扩散深度;根据经典动力学理论计算活化能及扩散系数;利用XRD分析相结构;再进行维氏硬度测量和耐磨实验。结果表明,经渗氮前处理的渗铬试样在各温度下铬原子扩散深度比未经渗氮均有增加,有预渗氮渗铬层最深达到20μm,未经渗氮渗铬层只有13μm,其活化能分别为106.09和147.47 k J/mol,表面硬度分别为1610及1760 HV。在各实验温度下,经渗氮预处理渗铬试样的耐磨性均比未经渗氮试样好,渗铬温度高于850℃耐磨性优于基材,低于850℃硬度虽然高于基材,但耐磨性不及基材。在较高温度(950和900℃)渗铬时,有渗氮预处理试样的渗铬层结构为Cr2C和Cr2N相,无渗氮预处理为Cr2C相;在较低温度(800和750℃)渗铬时,有渗氮预处理试样的渗铬层结构为Cr7C3和Cr N相,无渗氮预处理为Cr7C3相。展开更多
为了明确银原子含量对含银的类钻碳类(diamond like carbon,DLC)薄膜抗菌率和薄膜性能的影响,改变溅射功率,采用射频磁控溅射法在玻璃基底上制备一系列不同Ag含量(原子分数,下同)的Ag-DLC薄膜。通过扫描电镜、拉曼光谱分析仪、透射电镜...为了明确银原子含量对含银的类钻碳类(diamond like carbon,DLC)薄膜抗菌率和薄膜性能的影响,改变溅射功率,采用射频磁控溅射法在玻璃基底上制备一系列不同Ag含量(原子分数,下同)的Ag-DLC薄膜。通过扫描电镜、拉曼光谱分析仪、透射电镜、X射线衍射仪、原子力显微镜等手段,研究Ag-DLC薄膜的C键结形态以及等对薄膜的特性与抗菌率等。结果表明,随溅射功率增加,薄膜厚度、薄膜中Ag含量以及D峰与G峰的积分强度比值ID/IG都增加。并且薄膜表面逐渐变得粗糙,薄膜的硬度和电阻率均下降。生物特性上,随溅射功率增加,薄膜对大肠杆菌(E.coli)表现出更加优良的抗菌性能。当溅射功率为200 W时,薄膜中Ag的原子分数为19.77%,足以保证薄膜具有优良的抗菌性能,抗菌率达到98%。展开更多
文摘In order to study the effect of the microstructure with Al and V added TiN coatings, TiN, TiAlN and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of all the coatings were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results indicate that the addition of Al into TiN coatings reduces their lattice constant, but a further addition of V into TiAlN coatings increases their lattice constant. Moreover, the growth morphologies for TiN, TiAlN, and TiAlVN indicate that adding Al and V has a tendency to improve the columnar structure. The (111) and (200) orientations of TiN, TiAlN, and TiAlVN are identified. Theε(Fe3N-Fe2N) phase occurs because a small amount of Fe is present in the coatings. The interlayers of TiAlN and TiAlVN have the preferred (01 1 0) orientation. The texture (columnar) structure of the (111) and (200) orientations is observed in the TiAlN and TiAlVN coatings. An orientation relationship of (01 1 0)α-Ti//(110)T.M occurs between the interlayer and tempered martensite (T.M) in TiAlVN.
文摘采用热反应扩散沉积法(TRD)对有无预渗氮处理的SKD11钢试样分别以950、900、850、800和750℃进行气体热渗铬。利用SEM和EDS测量铬原子扩散深度;根据经典动力学理论计算活化能及扩散系数;利用XRD分析相结构;再进行维氏硬度测量和耐磨实验。结果表明,经渗氮前处理的渗铬试样在各温度下铬原子扩散深度比未经渗氮均有增加,有预渗氮渗铬层最深达到20μm,未经渗氮渗铬层只有13μm,其活化能分别为106.09和147.47 k J/mol,表面硬度分别为1610及1760 HV。在各实验温度下,经渗氮预处理渗铬试样的耐磨性均比未经渗氮试样好,渗铬温度高于850℃耐磨性优于基材,低于850℃硬度虽然高于基材,但耐磨性不及基材。在较高温度(950和900℃)渗铬时,有渗氮预处理试样的渗铬层结构为Cr2C和Cr2N相,无渗氮预处理为Cr2C相;在较低温度(800和750℃)渗铬时,有渗氮预处理试样的渗铬层结构为Cr7C3和Cr N相,无渗氮预处理为Cr7C3相。
文摘为了明确银原子含量对含银的类钻碳类(diamond like carbon,DLC)薄膜抗菌率和薄膜性能的影响,改变溅射功率,采用射频磁控溅射法在玻璃基底上制备一系列不同Ag含量(原子分数,下同)的Ag-DLC薄膜。通过扫描电镜、拉曼光谱分析仪、透射电镜、X射线衍射仪、原子力显微镜等手段,研究Ag-DLC薄膜的C键结形态以及等对薄膜的特性与抗菌率等。结果表明,随溅射功率增加,薄膜厚度、薄膜中Ag含量以及D峰与G峰的积分强度比值ID/IG都增加。并且薄膜表面逐渐变得粗糙,薄膜的硬度和电阻率均下降。生物特性上,随溅射功率增加,薄膜对大肠杆菌(E.coli)表现出更加优良的抗菌性能。当溅射功率为200 W时,薄膜中Ag的原子分数为19.77%,足以保证薄膜具有优良的抗菌性能,抗菌率达到98%。
